Two new unimolecular azocarbazole-based visible photobase generators (Ac-C-Base) with different strong bases such as 1,5,7-triazabicyclo[4.4.0]dec-5-ene (TBD) and 1,1,3,3-tetramethylguanidine (TMG) as the potential active species were prepared. Their structures were confirmed by 1 H NMR, 13 C NMR, and HR-MS. According to the photolysis and EPR results, Ac-C-Base could generate free radicals and strong bases simultaneously through the photodecarboxylation mechanism under 455 nm LED irradiation. Thus they can effectively catalyze the thiol-epoxy polymerization without post exposure baking under light exposure. In addition, the Ac-C-TBD containing a stronger base shows a faster polymerization rate and higher epoxy conversion.