RF hydrogen-plasma-related defects in thin SiO2/p-Si structures

Simeonov, Svilen P.; Yourukov, I; Kafedjiiska, E.; Szekeres, A.

doi:10.1016/s0042-207x(00)00478-4

Cited by 3 publications

(2 citation statements)

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“…Also one might argue that the plasma treatment was responsible for creating electrically active defects in the oxide as was previously reported by Simeonov and co workers [5], and that trapassisted tunneling through these defects was the cause of the degradation. However if degradation was mainly related to plasma damage one would expect that O 2 plasma treatment would induce the largest degree of damage compared to H 2 /D 2 treatment due to the much larger mass of oxygen ions.…”

Section: Contents Lists Available At Sciencedirectmentioning

confidence: 59%

Reliability degradation of thin HfO2/SiO2 gate stacks by remote RF hydrogen and deuterium plasma treatment

et al. 2008

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Section: Contents Lists Available At Sciencedirectmentioning

confidence: 59%

Reliability degradation of thin HfO2/SiO2 gate stacks by remote RF hydrogen and deuterium plasma treatment

et al. 2008

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“…Both air and hydrogenation plasmas are applied to alumina particles before the impregnation of a Ni precursor. It is known that RF plasma can remove surface impurities, generate surface defects, and passivate the surface. − It is expected that both air and hydrogen plasmas could improve the uniform deposition of a Ni precursor and enhance its interaction with support. The results of activity versus time of uncalcined, air (B), and H 2 (B) 5% Ni/Al 2 O 3 are summarized in Figure .…”

Section: Resultsmentioning

confidence: 99%

Promotion Effect of the Nonthermal RF Plasma Treatment on Ni/Al₂O₃ for Benzene Hydrogenation

Ratanatawanate

Macias

Jang

2005

Ind. Eng. Chem. Res.

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The effect of nonthermal RF plasma treatments on alumina-supported nickel catalysts was investigated for benzene hydrogenation because of recent increased interest in using plasma techniques for catalyst development. As evidenced by the temperature-programmed reduction (TPR) results, plasma treatments, either before or after impregnation, can significantly change the structure of an Ni precursor supported on alumina and the interaction between them, though treatments after impregnation have a more prominent effect. Plasma modifications both before and after impregnation of metal precursors are effective in improving the activity and stability of Ni catalysts for benzene hydrogenation. The plasma modification before impregnation is slightly more effective for the activity enhancement than the plasma modification after impregnation. However, plasma modifications after impregnation increase the stabilities of catalysts much more than those of catalysts with plasma modifications before the impregnation. The plasma effect on the activity and stability of Ni catalysts for benzene hydrogenation is likely due to the modified metal-support interaction induced by plasmas. It is clearly demonstrated that the nonthermal RF plasma is an effective way, at room temperature, to modify and enhance Ni/Al 2 O 3 catalysts for benzene hydrogenation.

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Low-temperature oxidation of hydrogen plasma cleaned crystalline silicon

Szekeres

Alexandrova

Proceedings. International Semiconductor Conference

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RF hydrogen-plasma-related defects in thin SiO2/p-Si structures

Cited by 3 publications

References 6 publications

Reliability degradation of thin HfO2/SiO2 gate stacks by remote RF hydrogen and deuterium plasma treatment

Reliability degradation of thin HfO2/SiO2 gate stacks by remote RF hydrogen and deuterium plasma treatment

Promotion Effect of the Nonthermal RF Plasma Treatment on Ni/Al₂O₃ for Benzene Hydrogenation

Low-temperature oxidation of hydrogen plasma cleaned crystalline silicon

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RF hydrogen-plasma-related defects in thin SiO2/p-Si structures

Cited by 3 publications

References 6 publications

Reliability degradation of thin HfO2/SiO2 gate stacks by remote RF hydrogen and deuterium plasma treatment

Reliability degradation of thin HfO2/SiO2 gate stacks by remote RF hydrogen and deuterium plasma treatment

Promotion Effect of the Nonthermal RF Plasma Treatment on Ni/Al2O3 for Benzene Hydrogenation

Low-temperature oxidation of hydrogen plasma cleaned crystalline silicon

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Product

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About

Promotion Effect of the Nonthermal RF Plasma Treatment on Ni/Al₂O₃ for Benzene Hydrogenation