RF plasma enhanced MOCVD of yttria stabilized zirconia thin films using octanedionate precursors and their characterization

Chopade, S.S.; Nayak, Chandrani; Bhattacharyya, D.; Jha, S. N.; Tokas, R.B.; Sahoo, N. K.; Deo, M. N.; Biswas, A.; Rai, Sanjay; Raman, Karthik V.; Rao, G. Mohan; Kumar, N.; Patil, D.S.

doi:10.1016/j.apsusc.2015.07.090

Cited by 12 publications

(7 citation statements)

References 36 publications

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“…The observed regular elongation in the d-spacing with increasing temperature ( figure 2(b)) in the lower region was used as guideline to explain the effect of annealing on YSZTFs. Chopade et al [38] demonstrated the evidence of Y-O framework substitution into Zr-O by monitoring the regular elongting in the lattice constant (a). This revelation was attributed to the higher ionic radii of Y 3+ compared to Zr 3+ , wherein the substitution of Zr by Y led to the bond lengths elongation around Y and shortening around Zr atoms [33].…”

Section: Resultsmentioning

confidence: 99%

Annealing temperature induced improved crystallinity of YSZ thin film

Rusli

Muhammad

Ghoshal

et al. 2020

Mater. Res. Express

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Six YSZ thin films (YSZTFs) were prepared at varied annealing temperature (380°C to 600°C) by radio frequency magnetron sputtering method. Glancing angle x-ray diffraction (GAXRD) pattern revealed the polycrystalline nature of all films with crystallite size in the range of 9 to 15 nm. Sample annealed at 400°C displayed the lowest microstrain (0.262) and crystallinity (60%). FESEM images disclosed dense, homogeneous and crack free growth of annealed samples compared to as-deposited one. EDX spectra detected the right elemental compositions of films. AFM images showed growth evolution of YSZ grains with size range between 0.2 to 5 nm and improved films' surface roughness. HRTEM measurement of the studied YSZTFs exhibited lattice orientation and atomic structure of nucleated YSZ nanocrystallites. Furthermore, film annealed at 500°C divulged less oriented structure because of dislocation.

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Section: Resultsmentioning

confidence: 99%

Annealing temperature induced improved crystallinity of YSZ thin film

Rusli

Muhammad

Ghoshal

et al. 2020

Mater. Res. Express

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“…There are examples of the effective use of various modifications of this method for the deposition of SOFC thin films [45]- [47]. However, CVD can be very expensive due to the power requirements of the process.…”

Section: Chemical Methodsmentioning

confidence: 99%

Place of electrophoretic deposition among thin-film methods adapted to the solid oxide fuel cell technology: A short review

Pikalova¹,

Калинина²

2019

Int. J. EQ

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Thin film technologies have attracted ever-growing interest in different industrial areas. Concerning solid oxide fuel cells (SOFCs), especially devices operating in the intermediate temperature range, such technologies are applied particularly for the deposition of dense, gas-tight electrolyte films with a thickness of several µm to decrease ohmic resistance and enhance the cell performance. The main requirements for the technology selected are its low cost, simplicity of the equipment used, short deposition time and flexibility regarding the cell shape. First, we overview thin-film technologies adapted to the deposition of SOFC functional layers, discussing their strengths and weaknesses, with special attention given to electrophoretic deposition (EPD) as being the most simple and cost-effective colloidal method to fabricate different electrolyte films. Then we present the contribution of our scientific group in the development of the EPD method. The preparation of stable suspensions for the EDP is one of the key requirements for its successful implementation and reproducibility; this was considered in detail and the effect of self-stabilization in suspensions based on nanopowders (7-15 nm), obtained by the method of laser evaporation with consequent condensation, was discussed. Such suspensions, exhibiting high positive ζ-potential values (30-50 mV), were shown to be suitable for EPD without the addition of dispersants or iodine. The requirements for the electrode substrates were formulated and a model of particle aggregation near the porous substrate surface was proposed. Deposition parameters were established for different electrolyte films -commonly used yttria-stabilized zirconia, single and multiply doped CeO 2 and proton-conducting doped BaCeO 3 electrolytes. As was shown, the deposition on the highly conducting cathode substrates is simpler to implement than the EPD on non-conducting anode substrates and, in addition, it produces high quality films which render high OCV values and superior SOFC performance.

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“…However, this work focused on producing fully cubic yttriastabilized zirconia (c-YSZ) at low temperatures through the use of plasma-enhanced chemical vapour deposition (PE-CVD). Despite its high cost, PE-CVD is a technique that uses metallorganic precursors under vacuum, allowing the deposition of ceramic coatings with controlled microstructure and composition at temperatures as low as 100 °C [14][15][16][17]. Although deposition temperature and applied power are the most studied variables in PE-CVD [14][15][16][17], other variables such as evaporation temperature of the ZrO 2 precursor [14,15,18], substrate position within the heating zone [19], and oxygen content in the plasma [17] also have an important impact on the gas maturation, which directly influence the microstructure and phase content of coatings since they impact the homogeneous and heterogeneous reactions.…”

Section: Introductionmentioning

confidence: 99%

Plasma enhanced chemical vapour deposition of ZrO₂ and YSZ coatings

Espinoza-Pérez

López‐Honorato

2023

Materials Science and Technology

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YSZ coatings can prevent deleterious thermal effects on thermolabile alloys, however, a challenge is their deposition with a cubic phase at temperatures below 800 °C. In this work, PE-CVD was used to deposit ZrO2 and YSZ coatings at ∼700 °C, by varying the evaporation temperature, the vol.% O2, and the substrate position. Our results showed that an evaporation temperature of 200 °C was needed to deposit ZrO2 coatings. At 700 °C, the tetragonal phase was favoured regardless of the position within the heating zone. At 800 °C with a content of 20–60 vol.% O2, monoclinic and tetragonal structures were predominant, probably due to an increase in the crystallite size. When the ZrO2 was dopped with Y2O3, a fully cubic structure of ZrO2 was deposited.

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RF plasma enhanced MOCVD of yttria stabilized zirconia thin films using octanedionate precursors and their characterization

Cited by 12 publications

References 36 publications

Annealing temperature induced improved crystallinity of YSZ thin film

Annealing temperature induced improved crystallinity of YSZ thin film

Place of electrophoretic deposition among thin-film methods adapted to the solid oxide fuel cell technology: A short review

Plasma enhanced chemical vapour deposition of ZrO₂ and YSZ coatings

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RF plasma enhanced MOCVD of yttria stabilized zirconia thin films using octanedionate precursors and their characterization

Cited by 12 publications

References 36 publications

Annealing temperature induced improved crystallinity of YSZ thin film

Annealing temperature induced improved crystallinity of YSZ thin film

Place of electrophoretic deposition among thin-film methods adapted to the solid oxide fuel cell technology: A short review

Plasma enhanced chemical vapour deposition of ZrO2 and YSZ coatings

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Plasma enhanced chemical vapour deposition of ZrO₂ and YSZ coatings