2013
DOI: 10.1364/ome.3.002112
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RF sputtered amorphous chalcogenide thin films for surface enhanced infrared absorption spectroscopy

Abstract: Abstract:The primary objective of this study is the development of transparent thin film materials in the IR enabling strong infrared absorption of organic compounds in the vicinity of metal nanoparticles by the surface plasmon effect. For developing these optical micro-sensors, heterostructures combining gold nanoparticles and chalcogenide planar waveguides are fabricated and adequately characterized. Single As 2 S 3 and Ge 25 Sb 10 Se 65 amorphous chalcogenide thin films are prepared by radiofrequency magnet… Show more

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Cited by 51 publications
(54 citation statements)
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“…Although the Ge‐As‐Se system is particularly attractive due to its greater glass‐forming region compared to Ge‐Sb‐Se system, the introduction of antimony provides higher polarizability increasing (non)linear refractive index and reduction in photosensitivity, representing an interesting option for nonlinear optics . Last but not least, improved shaping ability of Ge‐Sb‐Se glasses allows fabrication of fibers or thin films, which are of high importance considering optical sensor development, for instance . This is why study of thin films of ternary Ge‐Sb‐Se system have already attracted the attention of many authors …”
Section: Introductionmentioning
confidence: 99%
“…Although the Ge‐As‐Se system is particularly attractive due to its greater glass‐forming region compared to Ge‐Sb‐Se system, the introduction of antimony provides higher polarizability increasing (non)linear refractive index and reduction in photosensitivity, representing an interesting option for nonlinear optics . Last but not least, improved shaping ability of Ge‐Sb‐Se glasses allows fabrication of fibers or thin films, which are of high importance considering optical sensor development, for instance . This is why study of thin films of ternary Ge‐Sb‐Se system have already attracted the attention of many authors …”
Section: Introductionmentioning
confidence: 99%
“…These films have typically been prepared via sophisticated deposition techniques such as catalyst-assisted chemical vapor deposition, [35] sputtering, [36] thermal evaporation [24,37] and molecular beam epitaxy [38] that require energy-intensive, high vacuum deposition conditions not amenable to high-throughput mass production.…”
Section: Introductionmentioning
confidence: 99%
“…In particular, each grating having the As 2 S 3 thin film with thickness of 220 nm is deposited on a glass substrates using RF/DC sputtering techniques [32]. The proposed coupled grating structures can be fabricated as the following procedures: (i) two single gratings can be fabricated first using electron-beam (e-beam) lithography and inductively coupled plasma etching (ICP) techniques.…”
Section: Horizontal Shifted-alignmentmentioning
confidence: 99%