in electronics, [1] pharmaceuticals and healthcare, [2] energy harvesting and storage, [3][4][5][6] sensing, [7] coating, [8] structural application, [9][10][11] and many more. Nanofabrication techniques are generally divided into top-down and bottom-up categories. [12] Photolithography, [13] including UV, [14] focused ion beam, [15] electron-beam [16] and X-ray lithography, [17] FIB milling, [18] nanoimprint lithography [19] (stamping), dip-pen nanolithography, [20] and scanning probe lithography [21] are among the primary topdown nanofabrication techniques. These methods are specifically used for planar structures (e.g., chip-making) with micro/ nanoscale resolution features, depending on the wavelength of the source beam, and are not suitable for complicated 3D geometries. Bottom-up nanofabrication techniques are based on the self-assembly of unit compounds that use physical and chemical forces available to form larger structures. [22] Atomic layer deposition, [23] chemical [24,25] and physical vapor deposition, [26] sol-gel, [27] and DNA scaffolding [28] are among the most prominent bottomup nanofabrication methods. Self-assembly as the backbone of bottom-up fabrication techniques is the result of random collision of components within a solvent that reach an equilibrium state, either static or dynamic. [29] The resulting formation translates into deposited nanostructures through evaporation of particle-laden droplets in manufacturing techniques such as inkjet printing/direct writing, additive manufacturing, and various coating systems. [30][31][32] As the water evaporates, nanoparticles (NP) accumulate on the substrate in a form between a coffee ring shape (CRE), where the majority of the NPs gather on the periphery of the droplet, or in a disk shape (DS), where the NPs scatter across the base of the droplet. [33,34] Uniform particle dispersions, which correspond to the DS formation, are essential to scientific and industrial efforts. [35][36][37] However, their formation is impeded by the constant presence of outward radial Capillary effect driving suspended particles to the contact line, which is a result of the fluid stretching over the fixed contact line as the evaporation takes place. [38,39] One approach for amending CRE is implementing Marangoni flow, which is the result of surface tension gradient caused by either thermal effects or nonhomogeneous changes in composition, the latter of which happens within drying droplets with certain surfactants. [40][41][42][43] As a result, the exact shape of the deposits varies Achieving desired performance from self-assembly of nanoparticles (NPs) is challenging due to the stochastic nature of interactions among the constituent building blocks. Self-assembly of nano-colloids through evaporation of particle-laden droplets can be exploited to fabricate tailored nanostructures that add functionality and engineer the properties of manufactured components. The particle-particle and particle-solvent interactions, and delicate force balance among them are the main factor...