Robustness of an All-optical Limiter to Manufacturing Errors
Frederique Gadot,
Geraldine Guida
Abstract:In this paper, we present a numerical study to assess the robustness of an all-optical photonic limiter based on a twodimensional (2D PC) TiO2 photonic crystal with a single ZnO nonlinear two-photon absorption (TPA) defect to manufacturing disturbances. These disturbances studied here concern diameters and positions. It is revealed that our limiter configuration is very robust to manufacturing errors.
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