2020
DOI: 10.1007/s00339-020-03767-0
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Role of defects and microstructure on the electrical properties of solution-processed Al-doped ZnO transparent conducting films

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Cited by 19 publications
(5 citation statements)
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“… 19 After Al doping, the optical bandgap of ZnO slightly increased from 3.28 to 3.3 eV ( Figure 1 c), which was consistent with previous studies. 11 , 20 , 21 This phenomenon can be explained by the Burstain–Moss effect when the electron carrier concentration exceeded the conduction band (CB) of ZnO due to the high doping with Al. 20 The enhancement of electron concentration of ZnO due to Al doping was also confirmed by the decrease in the electrical resistivity from 7672 Ω cm (for the ZO film) to 3145 Ω cm (for the AZO film at 1.5 mol % Al content).…”
Section: Resultsmentioning
confidence: 99%
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“… 19 After Al doping, the optical bandgap of ZnO slightly increased from 3.28 to 3.3 eV ( Figure 1 c), which was consistent with previous studies. 11 , 20 , 21 This phenomenon can be explained by the Burstain–Moss effect when the electron carrier concentration exceeded the conduction band (CB) of ZnO due to the high doping with Al. 20 The enhancement of electron concentration of ZnO due to Al doping was also confirmed by the decrease in the electrical resistivity from 7672 Ω cm (for the ZO film) to 3145 Ω cm (for the AZO film at 1.5 mol % Al content).…”
Section: Resultsmentioning
confidence: 99%
“…As shown in Figure 1 d, both the PL spectra showed the emission peaks at 3.30–3.28 eV, 2.98–3.01 eV, 1.94–2.00 eV, and 1.74–1.75 eV assigned to the transitions from the ZnO conduction band (CB) to the ZnO valence band (VB), Zn-vacancy ( V Zn ), O-interstitial (O i ), and O-vacancy ( V O ), respectively. 21 , 22 Notably, the PL of AZO additionally showed a prominent emission peak at 3.22 eV, corresponding to the transition from the Zn-substituted Al (Al Zn ) state to VB. 21 , 22 This confirms that the doping Al would introduce Zn-substituted Al sited in the ZnO system, agreeing with the XRD results.…”
Section: Resultsmentioning
confidence: 99%
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“…Therefore, it is possible to exploit fabrication strategies based on novel deposition techniques like ink-jet printing, roll-to-roll, spray, among others, and consequently, improve the development of the large area electronics. Nonetheless, the limited temperature of processing can reduce the overall quality of the semiconductor layers, due to increased defects, inhomogeneities, roughness, porosity, etc, and consequently, the device behaviour can be compromised [4]. Hence, there is an important concern related with the trade-off between the reduction of the processing temperature and the device performance.…”
Section: Introductionmentioning
confidence: 99%
“…Al-doped ZnO (AZO) transparent conducting films are more highly desirable for their potential applications compared with SnO 2 :F and In 2 O 3 :Sn films, because they have good characteristics, such as abundant resources, non-toxicity, low cost and stability under a hydrogen plasma environment [3,4]. Up to now, the crater-like single-textured structures of AZO films, as mainstream light trapping structures, can be obtained by various methods, including wet chemical erosion after sputtering deposition and plasma etching, etc.…”
Section: Introductionmentioning
confidence: 99%