strate rotation, x sub , was related to the deposition rate, r, and the pitch of the film, p, as follows: p = r/x sub . Deposition rates were in the range 5-15 Å s -1 . Samples on both the silicon and glass substrates were cleaved using a diamond scribe prior to SEM imaging.Transmission Ellipsometry: A variable-angle spectroscopic ellipsometer (VASE, J. A. Woollam, Inc.) used in transmission mode was used to measure the transmission of p-and s-polarized light through the samples deposited on glass, and also to measure the transmission Mueller matrix of these samples, with the m 11 coefficient normalized to 1 at all wavelengths. Scans were performed in the wavelength range 400-700 nm. The transmission of p-and s-polarized light was averaged to determine the un-normalized m 11 (k) element of the Mueller matrix, which was used in combination with the m 14 (k) element to determine the selective transmission for the samples.Photoluminescence Detection: The photoluminescence response of the films was measured using the 365 nm emission line of a mercury lamp (Hamamatsu LightningCure L8333) for excitation and a spectrometer (Ocean Optics USB2000) for detection. The excitation light was focused onto a 5 mm by 5 mm square region. The polarization emitted for the helical films was measured by placing a quarter waveplate and a Glan-Taylor polarizer between the sample and the spectrometer for the helical films, with the fast axis of the waveplate oriented at ±45°to the polarizing axis. The orientation of the polarizer was kept constant with respect to the spectrometer grating, in order to eliminate the polarization sensitivity of the detector. The dense reference film was also tested in this setup and showed identical photoluminescence spectra, and thus a null dissymmetry factor spectrum, for both left-and right-handed emission.