2014
DOI: 10.1007/s00339-014-8665-z
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Role of MW-ECR hydrogen plasma on dopant deactivation and open-circuit voltage in crystalline silicon solar cells

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Cited by 5 publications
(2 citation statements)
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“…Despite plasma hydrogenation contributes to a large improvement in the electronic properties of thin n + pp + polycrystalline silicon cells, it simultaneously induces an etching of the emitter region (n + ) [9]. However, we showed in our previous works [10,11] that microwave plasma power around 650 W involving an electron cyclotron resonance (MW-ECR) induces an efficient passivation of defects with low damage of the emitter region (n + ). But a few works reported the direct effect of the n + emitter region on defects passivation in hydrogenated n + pp + cell structures and hydrogen diffusion in the polysilicon solar cell.…”
Section: Introductionmentioning
confidence: 90%
“…Despite plasma hydrogenation contributes to a large improvement in the electronic properties of thin n + pp + polycrystalline silicon cells, it simultaneously induces an etching of the emitter region (n + ) [9]. However, we showed in our previous works [10,11] that microwave plasma power around 650 W involving an electron cyclotron resonance (MW-ECR) induces an efficient passivation of defects with low damage of the emitter region (n + ). But a few works reported the direct effect of the n + emitter region on defects passivation in hydrogenated n + pp + cell structures and hydrogen diffusion in the polysilicon solar cell.…”
Section: Introductionmentioning
confidence: 90%
“…In n + pp + polysilicon photovoltaic structures, exposing the region of the n + emitter to the flow of hydrogen is a well-accepted technique for the passivation of defects and various impurities existing within the material. However, the amount of hydrogen introduced into the p region is greatly reduced by the presence of the n + layer doped with phosphorus [15][16][17]. Additionally, the photovoltaic efficiency of an n + pp + cell made of polycrystalline silicon is much lower than that of monosilicon due to high defect concentrations, especially at the grain boundaries of the polycrystalline material.…”
Section: Introductionmentioning
confidence: 99%