“…Accordingly, one always obtained thin layer contributions in the 99-100% range for all PANI nanolaments aer silica template removal, conrming a real interest of such ultra-small nanostructures for ensuring fast electron transfer processes, contrary to bulkier PANI deposits (even nanostructured ones) for which diffusion-controlled processes have been most oen reported (as a result of rather slow counter-ions diffusion through the polymeric material). 71,[74][75][76] For PANI wires in the silica membrane (i.e., before etching), some contributions of diffusioncontrolled reactions were evidenced (65%, 25%, 21% and 11%, respectively, for PANI deposits at 60 s, 100 s, 120 s and 160 s in CTAB-based lms, and 11% for both PANI deposits at 60 s and 100 s in ODAB-based lms (and less than 1% for those PANI deposits at 120 s and 140 s with ODAB lms)), conrming the above qualitative observations. Yet the contributions of thin layer behaviour remain in the majority (except for the very short PANI nanolaments prepared for 60 s in CTAB-based lms), suggesting that even in such conned environments the electron transfer processes were quite fast and not signicantly restricted by diffusion phenomena, consistent with the above estimation of PANI occupying roughly 1 2 to 1 3 of the mesopore section (thus keeping some space for easy mass transport of counter ions).…”