2018
DOI: 10.1021/acscatal.7b04277
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Role of Tungsten Doping on the Surface States in BiVO4 Photoanodes for Water Oxidation: Tuning the Electron Trapping Process

Abstract: The nanostructured BiVO 4 photoanodes were prepared by electrospinning and were further characterized by XRD, SEM, and XPS, confirming the bulk and surface modification of the electrodes attained by W addition. The role of surface states (SS) during water oxidation for the asprepared photoanodes was investigated by using electrochemical, photoelectrochemical, and impedance spectroscopy measurements. An optimum 2% doping is observed in voltammetric measurements with the highest photocurrent density at 1.23 V RH… Show more

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Cited by 157 publications
(170 citation statements)
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“…Generally, data obtained by EIS is expressed graphically in a Nyquist plot or a Bode plot . More importantly, EIS can be conducted at any bias, while IMVS is usually performed under open circuit condition . As a result, researchers can study the charge transport and recombination kinetics over a wide range of operating conditions using EIS technique …”
Section: Pec Performance and Charge Carrier Dynamic Measurement Technmentioning
confidence: 99%
See 1 more Smart Citation
“…Generally, data obtained by EIS is expressed graphically in a Nyquist plot or a Bode plot . More importantly, EIS can be conducted at any bias, while IMVS is usually performed under open circuit condition . As a result, researchers can study the charge transport and recombination kinetics over a wide range of operating conditions using EIS technique …”
Section: Pec Performance and Charge Carrier Dynamic Measurement Technmentioning
confidence: 99%
“…BiVO 4 is a semiconductor with proper energy band structure, which is nearly straddle the water reduction and oxidation potentials . The smaller band gap of BiVO 4 (≈2.4 eV) than that of WO 3 (2.5–2.8 eV) means that BiVO 4 has larger light absorption range, which is conducive to PEC water splitting . Lee et al prepared WO 3 /BiVO 4 composite film photoanode through layer‐by‐layer deposition .…”
Section: Heterojunction Constructionmentioning
confidence: 99%
“…This ratio can also be used to reect the kinetics of water oxidation at photoanode surface. 24,42,44,45 As shown in Fig. 7a, the ratios of R trap /R ct for pristine and reduced WO 3 photoanodes generally increased as the applied potential increased, while the minimum values of this ratio were observed at the onset potential (0.5 V RHE ) ( Fig.…”
Section: Resultsmentioning
confidence: 77%
“…These variables include a chemical capacitance (C ss ) representing the chemical capacitance of the traps, a trapping resistance (R trap ) representing the trapping/detrapping resistance of electrons that go from the conduction band to the surface traps, and a charge-transfer resistance (R ct ) representing the resistance of hole transfer. 42,43 The dependence of these variables (C ss , R trap , and R ct ) on the applied potential measured for our samples is shown in the ESI (Fig. S7, ESI †).…”
Section: Resultsmentioning
confidence: 99%
“…The stability issues can be classified as the following: (1) degradation of the LbL‐assembled film by electrochemical reactions on photoelectrodes and (2) detachment or delamination of the film. Nevertheless, we believe there will be many opportunities for non‐covalent, LbL approaches, because it has more flexibility in design and fabrication and also can be readily combined with other conventional approaches, such as doping,, defect engineering,, and heterojunction formation, , of an underlying photoelectrode, for the practical application of artificial photosynthesis.…”
Section: Electrostatic Layer‐by‐layer Assembly Of Molecular Electrmentioning
confidence: 99%