Roll-to-roll nanopatterning using jet and flash imprint lithography

Ahn, Sean; Ganapathisubramanian, Maha; Miller, Mike; Choi, Jin; Xu, Frank; Resnick, Douglas J.; Sreenivasan, S. V.

doi:10.1117/12.918040

Cited by 6 publications

(7 citation statements)

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“…Approaches like increasing pressure with an air-knife or backing roll can reduce gap thickness. Stronger materials support higher tensions that drive thinner gaps.…”

Section: Resultsmentioning

confidence: 99%

“…Although the process has been demonstrated to achieve features as small as 4 nm, the low yield associated with RLT non-uniformity is a formidable barrier to its implementation. For the consumer electronics market, high-volume manufacturing processes must reliably produce materials with very high uniformity to keep costs down and remain profitable .…”

Section: Introductionmentioning

confidence: 99%

“…One approach to overcoming this barrier is to use inkjet deposition to gain more fine control of liquid volume, thus creating the process depicted in Figure (differentiated from Figure a by the inkjet head), a R2R modality of an NIL method called jet-and-flash imprint lithography (J-FIL). , …”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Elastohydrodynamics of Roll-to-Roll UV-Cure Imprint Lithography

Cochrane

Tjiptowidjojo

Bonnecaze

et al. 2019

Ind. Eng. Chem. Res.

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The inextensible cylindrical shell theory and lubrication theory combine into a model for the elastohydrodynamics of a rolling-imprint modality of nanoimprint lithography (NIL). Foil-bearing theory describes the formation of the lubrication gap due to relative motion between a tensioned substrate and a rigid, cylindrical surface. Reproduction of the results of foil-bearing theory for both stiff and perfectly flexible substrates validates this coupled model and reveals a highly predictable region of uniformity that provides low shear stress conditions ideal for UV-cure. These results show theoretical limitations that are used to construct an operating window for predicting rolling-mode NIL process feasibility.

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“…Approaches like increasing pressure with an air-knife or backing roll can reduce gap thickness. Stronger materials support higher tensions that drive thinner gaps.…”

Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Elastohydrodynamics of Roll-to-Roll UV-Cure Imprint Lithography

Cochrane

Tjiptowidjojo

Bonnecaze

et al. 2019

Ind. Eng. Chem. Res.

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“…An attractive feature of imprint or embossing processes in general is that they can be adapted for use in continuous, roll-to-roll (R2R) manufacturing, 113,114,115,116,117,118 which reduces the cost of fabrication and increases the throughput. The cost per meter squared may range between 0.1 $·m −2 and 10 $·m −2 , depending on whether direct embossing or a thin-film ultraviolet light curing process is used.…”

Section: Nanoimprint Lithographymentioning

confidence: 99%

Nanomanufacturing: A Perspective

2016

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Nanomanufacturing, the commercially-scalable and economically-sustainable mass production of nanoscale materials and devices, represents the tangible outcome of the nanotechnology revolution. In contrast to those used in nanofabrication for research purposes, nanomanufacturing processes must satisfy the additional constraints of cost, throughput, and time to market. Taking silicon integrated circuit manufacturing as a baseline, we consider the factors involved in matching processes with products, examining the characteristics and potential of top-down and bottom-up processes, and their combination. We also discuss how a careful assessment of the way in which function can be made to follow form can enable high-volume manufacturing of nanoscale structures with the desired useful, and exciting, properties.

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“…The preferred mode of depositing the UV-curable monomer is through a multi-nozzle piezoelectric inkjet [6]. J-FIL has been developed across three distinct process platforms: (i) wafer-based step and repeat imprinting [7], (ii) whole-wafer imprinting in a single step [8], and (iii) imprinting on flexible substrates in a roll-to-roll configuration [9]. The use of inkjetting is common across all these process platforms.…”

Section: Introductionmentioning

confidence: 99%

Influence of discrete drop locations on film thickness uniformity in UV- nanoimprint lithography

Singhal

Sreenivasan

2016

Microelectronic Engineering

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Multi-nozzle inkjetting is the material deposition approach for a variant of UVnanoimprint lithography called Jet-and-Flash Imprint Lithography (J-FIL). J-FIL has several advantages with respect to addressing pattern density variations in the template as well as achieving low material waste when compared with spin-coating. In this work, the influence of discrete drop placement in J-FIL on residual layer thickness uniformity has been investigated with the help of a novel nonlinear lubrication theory model, which takes into account the compliant nature of the template in the presence of a moving contact line. This work is directed at thin residual layers (sub-20 nm), where a correlation exists between minimum drop resolution, inkjet nozzle pitch and residual layer thickness uniformity. Numerical simulations reveal that the non-uniformity resulting from discrete drop placement can exceed desired process tolerances when low film thicknesses are desired with relatively larger drop volumes. The results have been verified experimentally to reveal the same trend. This work can be useful in determining the correlation of inkjet drop resolution with inkjet nozzle pitch to meet process tolerances in the J-FIL process.

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Roll-to-roll nanopatterning using jet and flash imprint lithography

Cited by 6 publications

References 0 publications

Elastohydrodynamics of Roll-to-Roll UV-Cure Imprint Lithography

Elastohydrodynamics of Roll-to-Roll UV-Cure Imprint Lithography

Nanomanufacturing: A Perspective

Influence of discrete drop locations on film thickness uniformity in UV- nanoimprint lithography

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