Room temperature CO oxidation catalyzed by NiO particles on mesoporous SiO2 prepared via atomic layer deposition: Influence of pre-annealing temperature on catalytic activity

Jeong, Myung-Geun; Kim, Il Hee; Han, Sang Wook; Kim, Dae Han; Kim, Young Dok

doi:10.1016/j.molcata.2016.01.002

Cited by 33 publications

(26 citation statements)

References 39 publications

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“…From the literature, NiO nanocatalysts prepared by ALD and supported by mesoporous Al 2 O 3 and SiO 2 showed the highest catalytic activity after annealing at 450 °C, and the activity decreased as the annealing temperature increased from 450 to 750 °C3435. In contrast, the activity of the Fe 2 O 3 /Al 2 O 3 prepared by TR-CVD increased as the annealing temperature increased from 450 to 750 °C.…”

Section: Resultsmentioning

confidence: 99%

“…Catalysts based on nanostructures of Cu3132, Ni333435, and Co3637 compounds were shown to catalyze CO oxidation at room temperature. Again, the development of more stable catalysts continues to be a challenging issue; small nanoparticles (less than ~10 nm in size), which are catalytically active due to their high surface areas and abundance of catalytically-active, under-coordinated sites (e.g., edges), are not stable and tend to easily form larger particles3435.…”

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confidence: 99%

“…Catalytically-active nanostructures were either introduced into the mesoporous structure during the synthesis of mesoporous structures3238394041 or nanoparticles were post-incorporated into the pre-formed mesoporous template343542434445. The latter method is advantageous in that commercially-available and cost-effective mesoporous materials can be utilized; recently, atomic layer deposition (ALD) has been used to incorporate catalytically-active nanoparticles into mesoporous structures3435424344. For example, Pt nanoparticles were incorporated into carbon aerogels (resulting in high activity for CO oxidation)42 and NiO nanoparticles were deposited in mesoporous SiO 2 and Al 2 O 3 (resulting in highly stable catalytic activity for various heterogeneously-catalyzed reactions)3435.…”

mentioning

confidence: 99%

“…The latter method is advantageous in that commercially-available and cost-effective mesoporous materials can be utilized; recently, atomic layer deposition (ALD) has been used to incorporate catalytically-active nanoparticles into mesoporous structures3435424344. For example, Pt nanoparticles were incorporated into carbon aerogels (resulting in high activity for CO oxidation)42 and NiO nanoparticles were deposited in mesoporous SiO 2 and Al 2 O 3 (resulting in highly stable catalytic activity for various heterogeneously-catalyzed reactions)3435. It has often been observed that ALD successfully deposits nanoparticles on both the outermost surface and also into the deeper parts of the mesoporous material with a diffusion depth of several micrometers34354243.…”

mentioning

confidence: 99%

“…For example, Pt nanoparticles were incorporated into carbon aerogels (resulting in high activity for CO oxidation)42 and NiO nanoparticles were deposited in mesoporous SiO 2 and Al 2 O 3 (resulting in highly stable catalytic activity for various heterogeneously-catalyzed reactions)3435. It has often been observed that ALD successfully deposits nanoparticles on both the outermost surface and also into the deeper parts of the mesoporous material with a diffusion depth of several micrometers34354243. An alternative to ALD is the vapor infiltration method, in which mesoporous templates are exposed to the vapor of inorganic precursors under vacuum conditions for extended periods of time and then subsequently exposed to other oxidizing or reducing agents4546.…”

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confidence: 99%

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Low Temperature CO oxidation over Iron Oxide Nanoparticles Decorating Internal Structures of a Mesoporous Alumina

Kim

Seo

Park

et al. 2017

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Using a chemical vapor deposition method with regulated sample temperatures under ambient pressure conditions, we were able to fully decorate the internal structure of a mesoporous Al2O3 bead (~1 mm in particle diameter) with iron oxide nanoparticles (with a mean lateral size of less than 1 nm). The iron oxide-decorated Al2O3 showed a high CO oxidation reactivity, even at room temperature. Very little deactivation of the CO oxidation activity was observed with increasing reaction time at ~100 °C. Additionally, this catalyst showed high CO oxidation activity, even after annealing at ~900 °C under atmospheric conditions (i.e., the structure of the catalysts could be maintained under very harsh treatment conditions). We show that our catalysts have potential for application as oxidation catalysts in industrial processes due to the simplicity of their fabrication process as well as the high and stable catalytic performance.

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Section: Resultsmentioning

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confidence: 99%

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confidence: 99%

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Low Temperature CO oxidation over Iron Oxide Nanoparticles Decorating Internal Structures of a Mesoporous Alumina

Kim

Seo

Park

et al. 2017

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Nano‐Oxide Mesoporous Catalysts in Heterogeneous Catalysis

Fechete

Védrine

2017

Nanotechnology in Catalysis

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Nickel oxide thin films grown by chemical deposition techniques: Potential and challenges in next‐generation rigid and flexible device applications

Napari

Huq

Hoye

et al. 2020

InfoMat

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Nickel oxide (NiOx), a p‐type oxide semiconductor, has gained significant attention due to its versatile and tunable properties. It has become one of the critical materials in wide range of electronics applications, including resistive switching random access memory devices and highly sensitive and selective sensor applications. In addition, the wide band gap and high work function, coupled with the low electron affinity, have made NiOx widely used in emerging optoelectronics and p‐n heterojunctions. The properties of NiOx thin films depend strongly on the deposition method and conditions. Efficient implementation of NiOx in next‐generation devices will require controllable growth and processing methods that can tailor the morphological and electronic properties of the material, but which are also compatible with flexible substrates. In this review, we link together the fundamental properties of NiOx with the chemical processing methods that have been developed to grow the material as thin films, and with its application in electronic devices. We focus solely on thin films, rather than NiOx incorporated with one‐dimensional or two‐dimensional materials. This review starts by discussing how the p‐type nature of NiOx arises and how its stoichiometry affects its electronic and magnetic properties. We discuss the chemical deposition techniques for growing NiOx thin films, including chemical vapor deposition, atomic layer deposition, and a selection of solution processing approaches, and present examples of recent progress made in the implementation of NiOx thin films in devices, both on rigid and flexible substrates. Furthermore, we discuss the remaining challenges and limitations in the deposition of device‐quality NiOx thin films with chemical growth methods.

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Room temperature CO oxidation catalyzed by NiO particles on mesoporous SiO2 prepared via atomic layer deposition: Influence of pre-annealing temperature on catalytic activity

Cited by 33 publications

References 39 publications

Low Temperature CO oxidation over Iron Oxide Nanoparticles Decorating Internal Structures of a Mesoporous Alumina

Low Temperature CO oxidation over Iron Oxide Nanoparticles Decorating Internal Structures of a Mesoporous Alumina

Nano‐Oxide Mesoporous Catalysts in Heterogeneous Catalysis

Nickel oxide thin films grown by chemical deposition techniques: Potential and challenges in next‐generation rigid and flexible device applications

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