2014
DOI: 10.7567/jjap.53.05ga02
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Room-temperature intermixing for adhesion enhancement of Cu/SiO2interface by adopting SiO2surface dope and noble metal catalyzation

Abstract: We demonstrated a novel and simple approach to obtain a reliable Cu/SiO 2 stack. The key is the combination of SiO 2 surface doping with Zn and intermixing acceleration by a noble metal catalyst. Zn was incorporated into the SiO 2 surface by heat treatment of ZnO/SiO 2 stacks. The intermixing layer was formed even when Cu films were deposited at room temperature, and this layer dramatically improved the adhesion between Cu and SiO 2 .

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Cited by 5 publications
(9 citation statements)
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“…In these spectra, Cu, Pt, Si, and their oxides were clearly visible, indicating that an intermixing layer was formed at the Cu/glass interface. Similar formation of intermixing layer was also observed in our previous studies [5,20]. In our previous study, no Zn was detected by XPS in the intermixing layer formed in the Cu/Pt/Zn-doped glass stacks, although a small amount of Zn was obviously observed in Cu films and the intermixing layer by using transmission electron microscopy [21].…”
Section: Adhesion Improvement Using Sfcd-znosupporting
confidence: 86%
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“…In these spectra, Cu, Pt, Si, and their oxides were clearly visible, indicating that an intermixing layer was formed at the Cu/glass interface. Similar formation of intermixing layer was also observed in our previous studies [5,20]. In our previous study, no Zn was detected by XPS in the intermixing layer formed in the Cu/Pt/Zn-doped glass stacks, although a small amount of Zn was obviously observed in Cu films and the intermixing layer by using transmission electron microscopy [21].…”
Section: Adhesion Improvement Using Sfcd-znosupporting
confidence: 86%
“…Finally, Cu films were sputtered to a thickness of 50 nm with no intentional substrate heating or cooling. These deposition conditions are our standard for obtaining high adhesion [5]. The adhesion strength was evaluated with a micro-scratch tester (Rhesca CSR-2000) following Japanese Industrial Standard R3255 specifications [16], where the load applied to the horizontally vibrating stylus was increased continuously with the traveling displacement of the stylus.…”
Section: Methodsmentioning
confidence: 99%
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