The longitudinal and transverse magnetoresistance curves MR(H) and the magnetization isotherms M(H) were measured at T = 3 K and 300 K up to high magnetic fields for a microcrystalline (µc) Ni foil with grain sizes above 1 µm (corresponding to bulk Ni) and for a nanocrystalline (nc) Ni foil with an average grain size of about 100 nm. At T = 3 K, the field-induced resistivity change was quite different for the two microstructural states of Ni and the evolution of resistivity with magnetic field was also different which could be explained as arising from their very different electron mean free paths. At T = 300 K, the MR(H) curves of both the μc-Ni and nc-Ni samples were very similar to those known for bulk Ni. The MR(H) data were analyzed at both temperatures with the help of Kohler plots from which the resistivity anisotropy splitting (ΔρAMR) and the anisotropic magnetoresistance (AMR) ratio were derived, the latter values being very similar at both temperatures and for both microstructural states of Ni metal. The present high-precision MR(H) data revealed that the available theoretical models do not accurately describe the suppression of thermally induced magnetic disorder at around room temperature in high magnetic fields.