Room temperature nanoimprint lithography using a bilayer of HSQ/PMMA resist stack

Tao, Jiarui; Chen, Yifang; Zhao, Xingzhong; Malik, Adnan; Cui, Zheng

doi:10.1016/j.mee.2004.12.082

Cited by 32 publications

(20 citation statements)

References 3 publications

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“…Because of this, conventional imprint lithography with a thermal cycle has an inherent error in pattern placement due to different thermal expansion coefficients between the stamping templates and substrates if they are made from different materials. Quantitative investigations were conducted using two nanorulers fabricated on the Si template and GaAs substrate, respectively Y. Chen [24,119]. Figure 13 demonstrates the length deviations of the imprinted features from those in the templates due to linear thermal expansion.…”

Section: Distortion Of Pattern Placement In Thermal Nilmentioning

confidence: 99%

“…Chen et al [119] further proposed to carry out room temperature nanoimprint lithography (RTNIL) on bilayer of PMMA/HSQ for achieving metallic nanostructures such as gratings [121] and optical metamaterials. The key to the success in this process is to use HSQ as an outstanding etch mask against oxygen plasma with nearly zero etch rate, which protects the underneath PMMA from being etched.…”

Section: Room Temperature Nanoimprint On Pmma/hsq For Metallic Chiralmentioning

confidence: 99%

“…These deviations reflect the pattern placement error or pattern distortion in the thermal nanoimprint lithography. The diamonds are the measurement result for the NIL at room temperature, showing that no placement errors were observed [24,119] continuous roll-to-roll imprint on flexible plastic substrates has been achieved [149][150][151], which is promising for the manufacture of nanofluidic channels in industry when large area sealing challenge is overcome.…”

Section: Nanofluidic Channelsmentioning

confidence: 99%

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Applications of nanoimprint lithography/hot embossing: a review

Chen

2015

Appl. Phys. A

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This review concentrates on the applications of nanoimprint lithography (NIL) and hot embossing for the fabrications of nanolectronic devices, nanophotonic metamaterials and other nanostructures. Technical challenges and solutions in NIL such as nanofabrication of templates, removal of residual resist, pattern displacement in thermal NIL arising from thermal expansion are first discussed. In the nanofabrication of templates, dry etch in plasma for the formation of multi-step structures and ultra-sharp tip arrays in silicon, nanophotonic chiral structures with high aspect ratio in SiC are demonstrated. A bilayer technique for nondestructive removal of residual resist in thermal NIL is described. This process is successfully applied for the fabrication of T-shape gates and functional high electron mobility transistors. However, pattern displacement intrinsically existing in thermal NIL/hot embossing owing to different thermal expansions in the template and substrate, respectively, limits its further development and scale-up. Low temperature even room temperature NIL (RTNIL) was then proposed on HSQ, trying to eliminate the pattern distortion by avoiding a thermal loop in the imprint. But, considerable pressure needed in RTNIL turned the major attentions to the development of UVcuring NIL in UV-curable monomers at low temperature. A big variety of applications by low-temperature UV-curing NIL in SU-8 are described, including high-aspect-ratio phase gratings, tagging technology by nanobarcode for DNA sequencing, nanofluidic channels, nanophotonic metamaterials and biosensors. Hot embossing, as a parallel technique to NIL, was also developed, and its applications on ferroelectric polymers as well as metals are reviewed. Therefore, it is necessary to emphasize that this review is mainly attempted to review the applications of NIL/embossing instead of NIL technique advances.

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Section: Distortion Of Pattern Placement In Thermal Nilmentioning

confidence: 99%

Section: Room Temperature Nanoimprint On Pmma/hsq For Metallic Chiralmentioning

confidence: 99%

Section: Nanofluidic Channelsmentioning

confidence: 99%

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Applications of nanoimprint lithography/hot embossing: a review

Chen

2015

Appl. Phys. A

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“…In addition, metallic material has better thermal conductivity that makes heat dissipate easily and quickly instead of absorbing inside the structures that will result in deterioration of the materials. Many manufacturing processes, such as photolithography, nanoimprint lithography, have been demonstrated having the capability of generating the metallic gratings [1][2][3][4][5][6][7][8]. Among those manufacturing processes, nanoimprint lithography is the most popular method to fabricate the WGP.…”

Section: Introductionmentioning

confidence: 99%

Fabrication sub-10nm metallic gratings with carbon nanotube - A study by molecular dynamics simulation method

Cheng

Sung

2011

2011 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems

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In this research project we present a novel manufacturing process which is able to fabricate sub-10nm metallic gratings. It utilizes CNTs as a wire-cutting tool to remove the tiny metallic materials and fabricates the metallic gratings. The strategy is to embed the CNTs into the metallic material first, and then steer one ends of the CNTs upward with a constant velocity, CNTs will behavior like a knife and cut the material. A full scale three-dimension molecular dynamics simulation is employed to simulate the entire procedure. The formation mechanism and advantage of this innovation method are discussed; in addition, the effects of the steering velocity are exploited as well. The resulting data shows the sub-10nm metallic gratings can be fabricated successfully by exerting a small force on CNTs.

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“…In addition, NIL has also been developed to fabricate metallic patterns, such as nanowires [4][5][6]. However, this involves more procedures than the fabrication of polymeric nano-structures.…”

Section: Introductionmentioning

confidence: 99%