2018
DOI: 10.1021/acsaem.8b01263
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Room-Temperature-Sputtered Nanocrystalline Nickel Oxide as Hole Transport Layer for p–i–n Perovskite Solar Cells

Abstract: Nickel oxide (NiO x) is a promising hole transport layer (HTL) for perovskite solar cells (PSCs), as it combines good chemical stability, high broadband optical transparency and a high work function. Excellent power conversion efficiencies (PCE) have already been reported using solution-processed NiO x. However, solution-based techniques usually require high-temperature post-annealing to achieve the required HTL properties of NiO x , which jeopardizes its use for many applications, such as monolithic tandem so… Show more

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Cited by 106 publications
(98 citation statements)
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“…The VBM of ZnO (7.6 eV) is sufficient to block holes from the MAPbI 3 layer. The X‐ray diffraction (XRD) pattern of MAPbI 3 (Figure S1, Supporting Information) shows an intense signal corresponding to the perovskite alpha phase without secondary phases or PbI 2 traces, confirming the presence of well‐crystallized films which are matching well with the crystalline structure reported earlier …”
Section: Resultssupporting
confidence: 82%
See 1 more Smart Citation
“…The VBM of ZnO (7.6 eV) is sufficient to block holes from the MAPbI 3 layer. The X‐ray diffraction (XRD) pattern of MAPbI 3 (Figure S1, Supporting Information) shows an intense signal corresponding to the perovskite alpha phase without secondary phases or PbI 2 traces, confirming the presence of well‐crystallized films which are matching well with the crystalline structure reported earlier …”
Section: Resultssupporting
confidence: 82%
“…Opaque devices were measured without an aperture. For semitransparent device fabrication, the NiO x layer was deposited on precleaned ITO substrates via RF magnetron sputtering with high uniformity as defined in the previous study . All the subsequent layer deposition keeps the same recipe as the opaque devices, an ultrathin layer of DPO was spin‐coated at 5000 rpm for 30 s from a 1 mg mL −1 solution in isopropanol.…”
Section: Methodsmentioning
confidence: 99%
“…is convenient to produce all sorts of large area uniform thin films (semiconductor (Aydin et al, 2018;Guo et al, 2018;Silva Filho et al, 2018) and alloy (Huang et al, 2015)) in industry and effective to control the morphology and crystallinity of film via sputter process, and which could be perfectly applied in thin ETL films preparation for large size PSMs.…”
Section: H O D S D U E T O I T S S O P H I S T I C a T E D A P P L I mentioning
confidence: 99%
“…Moreover, it is also effective for obtaining a better contact between the substrate and the semiconducting film. This compact layer of a nanometer size can be deposited by means of different techniques such as Atomic Layer Deposition (ALD) [46,47], spray-pyrolysis (SP) [48], sol-gel approach (SG) [49], sputtering [50], among others. In the present case, we chose electrodeposition, which is an industrially attractive route due to having low costs and a scale-up capability [51].…”
Section: Introductionmentioning
confidence: 99%