Room-temperature ultraviolet light-emitting zinc oxide micropatterns prepared by low-temperature electrodeposition and photoresist

Abstract

High-quality (0001)-oriented zinc oxide (ZnO) micropatterns, 5-μm-wide microlines and 5-μm-diam microdot arrays, have been prepared on (111) Au-coated (100) Si wafer substrates by electrodeposition at 333 K in zinc nitrate aqueous solution and industrially employed positive type photoresist techniques. The ZnO micropatterns emitted ultraviolet light at photon energy of 3.25 eV due to recombination of bound excitons and visible light at 2.37 and 2.80 eV at room temperature.

Oxide Nanowire Arrays and Two-Dimensional Photonic Crystals for Control of Light(Review)

“…Chemical methods using selfassembled monolayers, 55 -57 interference lithography, 58 ,59 etching, 60 electron-beam lithography, 30 -32 ,61 ,62 and photolithography 63 have reported as low-temperature approaches for fabricating the micropatterns of various oxide materials. These chemical methods have various advantages over dry etching techniques, such as low cost, large-scale production, and their compatibility with plastic stamps or molds owing to the low process temperature.…”

Formation of Periodically Ordered Zinc Oxide Nanopillars in Aqueous Solution: An Approach to Photonic Crystals at Visible Wavelengths

“…In addition, micropatterned ZnO structures fabricated via other chemical processes display low aspect ratios or have polycrystalline structures consisting of randomly oriented particles. [5,6] For optical applications such as waveguides, it is important to reduce the number of grain boundaries in micropatterned ZnO structures, because grain boundaries scatter electromagnetic waves, leading to propagation loss. Moreover, considering the cutoff frequency of guided modes in waveguide structures, micropatterned ZnO structures fabricated previously using chemical deposition techniques were too thin for use as waveguides, because their thinness results in weak optical confinement.…”

“…[1][2][3][4] Obtaining micropatterned wide-bandgap oxides, such as zinc oxide, [5,6] indium tin oxide, [7] and titania, [8,9] is important for realizing transparent optoelectronics applications at UV-vis wavelengths. In particular, ZnO is promising for use in optoelectronic devices such as light emitters and waveguides at UV-vis wavelengths, [10,11] and thus the fabrication of ZnO microstructures is important for industrial applications.…”

“…In particular, ZnO is promising for use in optoelectronic devices such as light emitters and waveguides at UV-vis wavelengths, [10,11] and thus the fabrication of ZnO microstructures is important for industrial applications. Chemical methods, such as the formation of selfassembled monolayers, [5,8,9] interference lithography, [12,13] and conventional lithography, [6,14] have attracted attention as lowtemperature approaches for fabricating micropatterned oxide materials. These chemical methods have various advantages over dry etching techniques, such as low cost, largescale production, and compatibility with plastic stamps or molds owing to the low processing temperature.…”

Zinc oxide's hierarchical nanostructure and its photocatalytic properties

“…The remarkable properties of ZnO are its high exciton binding energy of 60 mV at room temperature and its wide, direct band gap of 3.37 eV [2]. ZnO is a typical electroceramic material and has promising applications in ultraviolet light emitting diodes, functional devices, dye-sensitized solar cells, chemical sensors, piezoelectric materials and transparent conductors [3][4][5][6]; in addition, it is inexpensive, nontoxic, and chemically stable. The optical and electronic properties of ZnO nanostructures are largely dependent on their composition, crystal quality, structural defects, dimensions and shape [7,8].…”