RuAl Thin‐Film Deposition by DC Magnetron Sputtering
Vincent Ott,
Tomasz Wojcik,
Szilard Kolozsvari
et al.
Abstract:The intermetallic transition metal B2 structured aluminide RuAl is a candidate material for use in various applications, including microelectronics and structural materials under demanding conditions, for example as oxidation and corrosion resistant materials or microelectronics. In contrast to other B2 transition metal aluminides, which usually suffer from brittle material behavior at room temperature, RuAl exhibits comparatively good room temperature ductility, in combination with further promising propertie… Show more
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