2004
DOI: 10.1016/s0967-0661(03)00154-0
|View full text |Cite
|
Sign up to set email alerts
|

Run-to-run control and performance monitoring of overlay in semiconductor manufacturing

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

0
19
0

Year Published

2009
2009
2022
2022

Publication Types

Select...
7
2
1

Relationship

0
10

Authors

Journals

citations
Cited by 68 publications
(19 citation statements)
references
References 5 publications
0
19
0
Order By: Relevance
“…with T p = 8, which provides a measure for machine overlay [3] and typically resembles a low-pass filter. Additionally the moving standard deviation filter operation:…”
Section: Resultsmentioning
confidence: 99%
“…with T p = 8, which provides a measure for machine overlay [3] and typically resembles a low-pass filter. Additionally the moving standard deviation filter operation:…”
Section: Resultsmentioning
confidence: 99%
“…Overlay [9] is a measure for position accuracy, hence the ability to perform a new scan atop a previous one. In terms of servo control performance, overlay can be assessed through the moving average filter operation.…”
Section: A Performance Measuresmentioning
confidence: 99%
“…with n a scanning time-scale parameter, essentially is a lowpass filter operation on the discrete-time error e(i), which is used to express the ability to position a single exposed wafer layer atop another; so-called scanning overlay [16]. The moving standard deviation filter operation, or…”
Section: Design For Performancementioning
confidence: 99%