Run-to-Run Process Control: Literature Review and Extensions

Integrated Product and Process Control for Sustainable Semiconductor Manufacturing

“…Control performance assessment is then carried out base on Eqs. (5,6). As a result, the optimal recipes for EWMA controllers are updated, and the OPP index is improved.…”

“…In practice, when a quality problem is identified from a previous run, statistical process control (SPC) is then applied to the process to update the recipe of the future runs in order to prevent the re-occurrence of the same problem. This is the fundamental idea for semiconductor run-to-run (RtR) process control [4,5]. Over the past 20 years, there is a substantial growth in literature existing on various RtR control schemes [6], including exponentially weighted moving average (EWMA) control [7,8], double-EWMA control [9] and RtR-MPC control [10], etc.…”

Monitoring feedback-controlled processes using adaptiveT2schemes

“…This model is rather physically representative and has been widely cited to illustrate chemical-mechanical polishing (CMP) processes, etching processes and epitaxial growth processes in semiconductor manufacturing and other discrete processes in related industries (see Sachs et al 1995, DelCastillo and Hurwitz 1997, Fan et al 2002, Jen et al 2004, and the references therein).…”

Recursive parameter estimation for categorical process control

“…An R2R process is typically illustrated by a linear model (see Hurwitz 1997, andApley andKim 2004 and the references therein), as follows: where y t is the key quality characteristic, u tÀ1 is the process input at step tÀ1 À1 and " t is a white noise series. Without loss of generality, we assume that " t $ Nð0, 2 Þ. Del Castillo (2006) discussed the control issue of processes represented by Equation (1).…”