2007
DOI: 10.1088/0957-4484/18/5/055303
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Ruthenium/aerogel nanocomposites via atomic layer deposition

Abstract: We present a general approach to prepare metal/aerogel nanocomposites via template directed atomic layer deposition (ALD). In particular, we used a Ru ALD process consisting of alternating exposures to bis(cyclopentadienyl)ruthenium (RuCp2) and air at 350 °C to deposit metallic Ru nanoparticles on the internal surfaces of carbon and silica aerogels. The technique does not affect the morphology of the aerogel template and offers excellent control over metal loading by simply adjusting the number of ALD cycles.… Show more

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Cited by 77 publications
(80 citation statements)
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“…One of these is an atomic layer deposition (ALD) process in which high-Z atoms, like Ru, are deposited on the strands of carbon aerogel foam [18]. In another development, fabrication of pure-metal foams has begun.…”
Section: Introductionmentioning
confidence: 99%
“…One of these is an atomic layer deposition (ALD) process in which high-Z atoms, like Ru, are deposited on the strands of carbon aerogel foam [18]. In another development, fabrication of pure-metal foams has begun.…”
Section: Introductionmentioning
confidence: 99%
“…The relatively low nucleation density of ALD noble metals enables also the deposition of thin nanoparticulate noble metal films. [21,24] As compared to sol-gel and solution impregnation methods, ALD has some potential advantages. First, the dimensions of the metal catalyst and the underlying oxide film can be adjusted accurately by the number of ALD cycles applied.…”
Section: Resultsmentioning
confidence: 99%
“…[10][11][12] However, for the conformal deposition on porous materials, the exposure time of precursor molecules should be much longer comparing with the exposure time on a flat substrate, because the chemisorption of the precursor is limited by the Knudsen diffusion on the internal surface of the porous materials. [13][14][15][16][17][18][19][20][21] In smaller pores with a longer depth, it is more difficult for the precursor to reach vacant sites which locate at the core of the porous materials. In addition, the number of adsorption sites in the porous materials is much higher than that in the flat substrate, due to their high specific surface area.…”
Section: 9mentioning
confidence: 99%