2020
DOI: 10.1016/j.microc.2019.104568
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Safe limits for the application of nonlinear optical microscopies to cultural heritage: A new method for in-situ assessment

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Cited by 14 publications
(17 citation statements)
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“…There are recent MPEF studies performed on a series of commercial acrylic paints that highlighted the dependence of the emitted fluorescence intensity on material composition and illumination conditions. This work evaluates the damage of near-infrared femtosecond pulsed lasers and establishes safe laser thresholds on a variety of painted artworks [121]. However, further studies employing different excitation wavelengths, pulse durations, and repetition rates are necessary to evaluate and determine the optimum parameters for the safe implementation of NLM on CH objects.…”
Section: Synergy Of Non-linear Techniques With Other Imaging Modalitiesmentioning
confidence: 99%
“…There are recent MPEF studies performed on a series of commercial acrylic paints that highlighted the dependence of the emitted fluorescence intensity on material composition and illumination conditions. This work evaluates the damage of near-infrared femtosecond pulsed lasers and establishes safe laser thresholds on a variety of painted artworks [121]. However, further studies employing different excitation wavelengths, pulse durations, and repetition rates are necessary to evaluate and determine the optimum parameters for the safe implementation of NLM on CH objects.…”
Section: Synergy Of Non-linear Techniques With Other Imaging Modalitiesmentioning
confidence: 99%
“…The second device used was a nonlinear optical microscope developed at IQFR, which allows for the point-wise collection of MPEF signals in epi-detection mode. A detailed description of this device can be found in [19,27]. Briefly, the excitation light source is a mode-locked Ti:Sapphire femtosecond laser emitting at 800 nm, releasing 70 fs pulses at a repetition rate of 80 MHz.…”
Section: Nonlinear Optical Microscopy Via Multi-photon Excitation Flumentioning
confidence: 99%
“…Briefly, the excitation light source is a mode-locked Ti:Sapphire femtosecond laser emitting at 800 nm, releasing 70 fs pulses at a repetition rate of 80 MHz. The laser beam passes through a set of two continuously variable metallic neutral density filters arranged in a serial mode (Thorlabs, NDC-50C-2M) in order to get average powers below 5 mW (which is below the damage threshold of the paints [19]). The laser beam was focused on the sample by a microscope objective lens (M Plan Apo HL 50X, Mitutoyo, NA 0.42).…”
Section: Nonlinear Optical Microscopy Via Multi-photon Excitation Flumentioning
confidence: 99%
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