2018
DOI: 10.1016/j.physb.2017.10.026
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Salt-assisted clean transfer of continuous monolayer MoS 2 film for hydrogen evolution reaction

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Cited by 16 publications
(14 citation statements)
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“…We observed a slight change in FWHM of E 1 2g (0.07 cm –1 for SiO 2 → SiO 2 ; 0.13 cm –1 for SiO 2 /Si → mica; 0.04 cm –1 for SiO 2 /Si sapphire) and A 1g (0.08 cm –1 for SiO 2 → SiO 2 ; 0.06 cm –1 for SiO 2 /Si → mica; 0.09 cm –1 for SiO 2 /Si → sapphire) after the transfer. In the conventional transfer method, the change in FWHM of E 1 2g and A 1g modes was around 1.7 and 1.41 cm –1 , respectively, which is significantly larger than our process. This comparatively less change in FWHM of Raman modes clearly confirms that the crystalline quality of MoS 2 flakes is not affected by this transfer process and better than the conventional method, which degrades the film quality.…”
Section: Resultscontrasting
confidence: 62%
See 1 more Smart Citation
“…We observed a slight change in FWHM of E 1 2g (0.07 cm –1 for SiO 2 → SiO 2 ; 0.13 cm –1 for SiO 2 /Si → mica; 0.04 cm –1 for SiO 2 /Si sapphire) and A 1g (0.08 cm –1 for SiO 2 → SiO 2 ; 0.06 cm –1 for SiO 2 /Si → mica; 0.09 cm –1 for SiO 2 /Si → sapphire) after the transfer. In the conventional transfer method, the change in FWHM of E 1 2g and A 1g modes was around 1.7 and 1.41 cm –1 , respectively, which is significantly larger than our process. This comparatively less change in FWHM of Raman modes clearly confirms that the crystalline quality of MoS 2 flakes is not affected by this transfer process and better than the conventional method, which degrades the film quality.…”
Section: Resultscontrasting
confidence: 62%
“…Therefore, the transfer of atomically thin 2D materials is not affected by these constraints; thus, it can be more flexible for device fabrication. So far, considerable efforts have been invested to transfer 2D TMDCs from growth substrate onto arbitrary substrate. Early investigations used hazardous chemical etchants to transfer 2D flakes onto the arbitrary substrate. As an example, the transfer of 2D flakes from sapphire to other substrates involves highly concentrated hydrofluoric acid (HF), which is environmentally unfriendly and causes serious damage to the 2D material .…”
Section: Introductionmentioning
confidence: 99%
“…[ 13–16 ] Since a typical CVD process for preparing monolayer MoS 2 requires a high synthetic temperature of >700 °C, the state‐of‐the‐art solution is to introduce an additional transfer process in which the as‐grown monolayer MoS 2 is mechanically and/or chemically detached from the original growth substrate and placed on the target substrate. [ 17–20 ] However, the transfer process often induces mechanical damages on MoS 2 such as wrinkles, voids, and cracks or impurity residues (e.g., poly(methyl methacrylate) (PMMA), potassium hydroxide (KOH)) that degrade the quality of the material. [ 21 ]…”
Section: Introductionmentioning
confidence: 99%
“… 15 Significant efforts have been made to transfer 2D material films without degrading the film quality, which is critical for the success of 2D materials. 23 28 In early studies, hazardous chemical etchants such as hydrofluoric acid (HF), hydrochloric acid (HCl), and nitric acid (HNO 3 ) were used to transfer 2D materials, which are environmentally unfriendly and degrade the film quality. 24 , 29 Strong bases such as KOH and NaOH have also been used to transfer the 2D material film, which are more attractive than hazardous chemical etchants.…”
Section: Introductionmentioning
confidence: 99%