2000
DOI: 10.1117/12.389055
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Scalable pattern generator data path: for the future

Abstract: With the shrinking design rules for semiconductors mask data complexity increases continuously. The increasing use of oPc, which has become common for advanced masks, reinforces this trend. The requirements on data processing increase and make it a possible bottleneck. Increasing write times directly impact the cost of the photomask. These facts raise the question ofhow to design a data path that will not limit the writing speed and throughput ofa pattern generator.The Micronic Omega6000 laser pattern generato… Show more

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