2017
DOI: 10.1016/j.matdes.2017.05.017
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Scaling aerosol assisted chemical vapour deposition: Exploring the relationship between growth rate and film properties

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Cited by 51 publications
(48 citation statements)
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“…We have been able to show that AACVD can be scaled from 10 to 100 snmmin À1 without loss of functionality. [69] This shows that AACVDi sas calable process. However, additional work is required to get it to rates that are appropriate for industrial applications.…”
Section: Currentchallenges and Future Directionsofa Acvdmentioning
confidence: 83%
See 1 more Smart Citation
“…We have been able to show that AACVD can be scaled from 10 to 100 snmmin À1 without loss of functionality. [69] This shows that AACVDi sas calable process. However, additional work is required to get it to rates that are appropriate for industrial applications.…”
Section: Currentchallenges and Future Directionsofa Acvdmentioning
confidence: 83%
“…Therefore, increasing the deposition rate whilst being able to maintain the functional properties of the deposited thin films and high sustainability of the process, is a key area that needs to be established. We have been able to show that AACVD can be scaled from 10 to 100 s nm min −1 without loss of functionality . This shows that AACVD is a scalable process.…”
Section: Aerosol Routes To Sustainable Manufacture Of Materialsmentioning
confidence: 99%
“…2 Another advantage of AACVD is that doping is easily achievable, since the stoichiometric ratio of dopant precursors to lm precursors in solution can be closely related to the stoichiometric ratio in the resultant lm. 3 By comparison, doping lms using APCVD requires precise control over gas ow rates, which can be unreliable, and difficult to reproduce.…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, recent work by Powell et al has demonstrated that AACVD has the potential to be scaled up for industrial depositions. 3 TCOs are a class of semiconductor material, which combine optical transparency with electrical conductivity. This grants them a wide range of applications in optoelectronic devices, such as solar cells, touch screens, light emitting diodes (LEDs) and liquid crystal displays (LCDs).…”
Section: Introductionmentioning
confidence: 99%
“…The deposition of tin oxide thin films have been reported by using various methods such as spray pyrolysis, electron beam evaporation, magnetic sputtering and chemical vapor deposition . Among these techniques, aerosol assisted chemical vapour deposition (AACVD) has emerged as a promising technique to deposit large area films at high growth rate .…”
Section: Introductionmentioning
confidence: 99%