2005
DOI: 10.1007/s10470-005-6761-x
|View full text |Cite
|
Sign up to set email alerts
|

Scaling Analysis of On-Chip Power Grid Voltage Variations in Nanometer Scale ULSI

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
13
0

Year Published

2006
2006
2018
2018

Publication Types

Select...
4
2
1

Relationship

1
6

Authors

Journals

citations
Cited by 27 publications
(13 citation statements)
references
References 23 publications
0
13
0
Order By: Relevance
“…At the circuit level, buffer insertion and gate sizing (physical design process) can be made thermally aware because interconnect and gate delays are strongly dependent on temperature [33]. Besides synthesis, placement, and routing algorithms, power-grid analysis can be made thermally aware to ensure acceptable voltage-drop levels in the presence of significant chip substrate temperature gradients [8,10].…”
Section: Implementation Of the Electrothermally-aware Methodologymentioning
confidence: 99%
See 3 more Smart Citations
“…At the circuit level, buffer insertion and gate sizing (physical design process) can be made thermally aware because interconnect and gate delays are strongly dependent on temperature [33]. Besides synthesis, placement, and routing algorithms, power-grid analysis can be made thermally aware to ensure acceptable voltage-drop levels in the presence of significant chip substrate temperature gradients [8,10].…”
Section: Implementation Of the Electrothermally-aware Methodologymentioning
confidence: 99%
“…Increased temperature deteriorates circuit performance by degrading device carrier mobility and increasing interconnect metal resistivity. This, in turn, will impact physical design issues including Power/Ground integrity [8] and placement and routing schemes [9][10][11]. At the system-level, thermal management (packaging and cooling) solutions are also affected by substrate temperature because they have to meet the maximum heatflux requirements at the silicon-package interface [12].…”
Section: Implications Of Substrate Temperature Rise and Non-uniform Tmentioning
confidence: 99%
See 2 more Smart Citations
“…Secondly, higher switching frequency increases ∆I drop. in 65 nm technology if the necessary precautions are not taken [3]. Mitigating power supply noise becomes a grand challenge for the sustainability of future largescale integration development.…”
Section: Introductionmentioning
confidence: 99%