2008
DOI: 10.1002/pssa.200723442
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Scaling limits and MHz operation in thiophene‐based field‐effect transistors

Abstract: To achieve high performance organic field effect transistors (OFETs) with enhanced currents, high switching speeds and improved integration density the channel length L is downscaled to the sub‐micrometer regime. The influence of important scaling parameters on the electrical performance of bottom contact devices is analyzed. High‐mobility oligo‐ and polythiophenes were used as semiconductor, which combine the advantages of highly ordered growth with processibility from solution. Devices with optimized paramet… Show more

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Cited by 19 publications
(16 citation statements)
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“…at least 1.5 times the length of h D (i.e., h D :L ratio of 1:1.5) and, in some cases, 5 times as much. 34,35 The scaling in the case of the vertical transistor configuration is rather associated with the "tunnel" effect discussed earlier. If the "tunnel" effect is the dominant one for this scaling of the dielectric thickness then the ratio to be kept is that of h D :D. Transfer characteristics presented in Fig.…”
Section: -10mentioning
confidence: 94%
“…at least 1.5 times the length of h D (i.e., h D :L ratio of 1:1.5) and, in some cases, 5 times as much. 34,35 The scaling in the case of the vertical transistor configuration is rather associated with the "tunnel" effect discussed earlier. If the "tunnel" effect is the dominant one for this scaling of the dielectric thickness then the ratio to be kept is that of h D :D. Transfer characteristics presented in Fig.…”
Section: -10mentioning
confidence: 94%
“…In the context of the reported literature these represent state-of-the-art values for solution-processed organic devices fabricated on plastic foil. [12][13][14][15][16][17][18][19][20][21] This is achieved without the need for a rigid substrate, using solution-processed dielectric and semiconductor, and is regardless of the relatively low effective mobility of these devices ( µ sat = 0.03-0.06 cm 2 V −1 s −1 ), highlighting the impact and importance of self-aligned, low stray capacitance architecture on device performance.…”
Section: Maximum Device Switching Speedmentioning
confidence: 97%
“…Only a handful of reports on OFET alternating current (AC) characterization use fabrication techniques that even partially fulfi l the requirements set out above. [12][13][14][15][16][17][18][19][20][21][22][23] However to build functional fl exible circuits it is important to understand how to reconcile device fabrication and performance. [24][25][26] This is a requirement if plastic electronics are to be implemented in applications such as radio frequency identifi cation (RFID) tags which operate at megahertz frequencies.…”
Section: Doi: 101002/aelm201500024mentioning
confidence: 99%
See 1 more Smart Citation
“…= {{W}\over{{2L}}}C\mu \left( {V_{G_S} - V_{TH} } \right)^2$ , where C is the gate dielectric capacitance per unit area, are used to estimate the charge carrier mobility in microgap devices in the linear and saturation regime, respectively. In contrast, a model for the linear and saturation regime of short‐channel transistors is found to extend the gradual channel approximation model by introducing ohmic contact resistances in series at source ( R S ) and drain ( R D ), as follows:26 …”
Section: Introductionmentioning
confidence: 99%