Scaling-up perovskite solar cells on hydrophobic surfaces

Innovative PIN-type perovskite solar cells with 17% efficiency: processing and characterization

“…Although the use of other anti-solvents leads to more homogeneous deposits, microscopic observations show much smaller pinhole diameters (less than 15 µm, and without any HTL dissolution) in the case of ethyl acetate (EA) and isopropanol (IPA). Such effect of the nature of the anti-solvent has already been observed in the literature, but generally at a lower scale 46,47 . IPA and EA appears here to be the best candidates.…”

Indoor Perovskite Photovoltaics for the Internet of Things—Challenges and Opportunities toward Market Uptake

“…Microscale pinholes do not exist, while nanoscale pinholes at the grain boundaries are not avoidable. [ 162 ] The formation of micro‐ and nano‐scale pinholes directly impacts the V OC and FF distribution of devices.…”

“…This challenge is tackled in a breakthrough work that discusses the proper choice of adduct solvent and tries to shed light into why efficiency falls with increasing active area and how its drop can be halted. [ 162 ] For instance, as far as MAPbI 3 in the case of inverted architecture devices is concerned, it has been suggested that DMF/DMSO‐based ink compositions that enable good quality perovskites on hydrophilic substrates (high surface free energy) may not do so on hydrophobic substrates (low surface free energy). This is ascribed to an unavoidable polarity mismatch between a cosolvent of DMF:DMSO and a hydrophobic underlying HTL like PTAA.…”

Linked Nickel Oxide/Perovskite Interface Passivation for High‐Performance Textured Monolithic Tandem Solar Cells

“…[22] Moreover, the genuine p-type nature and suitable band alignment of NiO x with perovskites allow for efficient hole extraction. [22,23] In addition, the commonly employed organic HTLs in p-i-n configuration introduce challenges with perovskite ink wettability due to their hydrophobic nature, [24,25] especially toward scaled devices; NiO x serves a simple alternative with reproducible processing of the perovskite thanks to its hydrophilic surface. [24,26,27] Several preparation techniques have been reported for NiO x thin-films, such as sol-gel synthesis, [28] nanoparticles spin-coating, [29,30] e-beam evaporation, [31] solution-combustion assisted deposition, [32] electrodeposition, [33] atomic-layer deposition (ALD), [34,35] and magnetron sputtering.…”

“…[22,23] In addition, the commonly employed organic HTLs in p-i-n configuration introduce challenges with perovskite ink wettability due to their hydrophobic nature, [24,25] especially toward scaled devices; NiO x serves a simple alternative with reproducible processing of the perovskite thanks to its hydrophilic surface. [24,26,27] Several preparation techniques have been reported for NiO x thin-films, such as sol-gel synthesis, [28] nanoparticles spin-coating, [29,30] e-beam evaporation, [31] solution-combustion assisted deposition, [32] electrodeposition, [33] atomic-layer deposition (ALD), [34,35] and magnetron sputtering. [36] This versatility in deposition methodology, combined with superior solvent tolerance and optoelectronic stability, has aided in the widespread use of NiO x as HTL across various PV technologies, with promising results in recent years for both single-junction PSCs, [26,30,31] and perovskite/silicon tandem devices.…”