Scheduling twin-cluster tools for complete concurrent processing with wafer residence time constraints
Hao Zhou,
Chunrong Pan
Abstract:With the requirements of physical vapor deposition and chemical vapor deposition processes, twin-cluster tools are widely used in the current wafer fabrication. Cycle scheduling ensures that wafers have the same quality, however, twin-cluster tools involve resource coordination between two tools, which makes cycle scheduling more sophisticated. A steady-state cycle scheduling problem of twin-cluster tools with a complete concurrent processing module is studied, considering the wafer residency time constraints.… Show more
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