Nanostructured films have been widely
used for preparing various
advanced thin-film devices because of their unique electrical, optical,
and plasmonic characteristics associated with the nano-size effect.
In situ, nondestructive and high-resolution characterization of nanostructured
films is essential for optimizing thin-film device performance. In
this work, such thin-film characterization was achieved using a hyperspectral
dark-field microscope (HSDFM) that was constructed in our laboratory
by integrating a hyperspectral imager with a commercial microscope.
The HSDFM allows for high-resolution (Δλ = 0.4 nm) spectral
analysis of nanostructured samples in the visible-near-infrared region
with a spatial resolution as high as 45 nm × 45 nm (corresponding
to a single pixel). Four typical samples were investigated with the
HSDFM, including the gold nanoplate array, the self-assembled gold
nanoparticle (GNP) sub-monolayer, the sol-gel nanoporous titanium
dioxide (TiO2) film, and the layer-stacked molybdenum disulfide
(MoS2) sheet. According to the experimental results, the
plasmon resonance scattering bands for nanoplate clusters are identical
with those for individual gold nanoplates, indicating that the gap
between adjacent nanoplates is too large to allow plasmonic coupling
between them. A different case was observed with the self-assembled
GNP sub-monolayer in which the aggregated clusters with the internal
plasmonic interaction show a considerable red-shift of the plasmon
resonance band relative to the isolated single GNP. In addition, the
protein adsorption on the nanoporous TiO2 film was observed
to be inhomogeneous on the microscale, and the stepped boundaries
of the MoS2 sheet were clearly observed. A quasi-linear
dependence of the single-pixel light intensity on the step height
was obtained by combining the HSDFM with atomic force microscopy.
The minimum thickness detectable by the present HSDFM is 6.5 nm, corresponding
to the 10-layer MoS2 film. The work demonstrated the outstanding
applicability of the HSDFM for nanostructured film characterization.