2023
DOI: 10.1021/acscatal.3c00617
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Screened Fe3 and Ru3 Single-Cluster Catalysts Anchored on MoS2 Supports for Selective Hydrogenation of CO2

Abstract: Efficient CO2 hydrogenation into valuable products is a promising strategy to address environmental issues and achieve green development goals, yet developing highly active and selective catalysts still remains a major challenge. The single-cluster catalysts frequently exhibit unexpected catalytic performance for complex reactions in heterogeneous catalysis due to the synergistic interaction between the active atoms. In this work, we have proposed candidate catalysts with Fe3 and Ru3 clusters anchored at the S… Show more

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Cited by 27 publications
(10 citation statements)
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“…Meanwhile, the KIE of D 2 O replaced by H 2 O was 1.35 ( k H / k D ∼ 1.35, Table 2) during the MSR reaction, which is smaller than that in the bare WGS test, suggesting a normal secondary isotopic effect. 67 This is also in good agreement with the assumption that the contribution of WGS to hydrogen formation under this differential reaction condition ( ca. 1 kPa CH 3 OH, 2 kPa H 2 O, Ar balanced, 623 K, GHSV = 19 099 h −1 ) is negligible.…”
Section: Resultssupporting
confidence: 86%
See 1 more Smart Citation
“…Meanwhile, the KIE of D 2 O replaced by H 2 O was 1.35 ( k H / k D ∼ 1.35, Table 2) during the MSR reaction, which is smaller than that in the bare WGS test, suggesting a normal secondary isotopic effect. 67 This is also in good agreement with the assumption that the contribution of WGS to hydrogen formation under this differential reaction condition ( ca. 1 kPa CH 3 OH, 2 kPa H 2 O, Ar balanced, 623 K, GHSV = 19 099 h −1 ) is negligible.…”
Section: Resultssupporting
confidence: 86%
“…As the adsorption of CO 2 is difficult from highly dispersed transition metals, we would suggest that the coverage of CO 2 from the catalytic surface is negligible. 65–67 The H 2 formation rates increased with H 2 O pressure with the nearly first-order dependence ( r H 2 ∼ [H 2 O] 0.6 ), then H 2 O or –OH may not be the MASIs on the surface of catalysts. The CO 2 formation rates decreased with H 2 pressure with the nearly negative first-order dependence ( r CO 2 ∼ [H 2 ] −0.8 ), indicating that H 2 or its derivatives ( i.e.…”
Section: Resultsmentioning
confidence: 99%
“…To assess the thermodynamic stability, the formation energy ( E f ) was calculated with the following equation: 29 E f = E total − E sub − 2 E AE Here, E total and E sub represent the total energies of double S/Se defective TMD substrates with and without anchored AE metals, respectively. E AE denotes the energy per atom of the bulk of the AE metal.…”
Section: Computational Detailsmentioning
confidence: 99%
“…[24][25][26][27] Owing to their distinctive geometric and electronic structures, 2D TM dichalcogenide (TMD) nanosheets, particularly MoS 2 , have proven to be exceptional substrates for the fabrication of atomically dispersed catalysts. [28][29][30][31] Advancements in experimental techniques have enabled the controlled creation of double S vacancies in MoS 2 . [32][33][34] Capitalizing on these double S vacancies, Jiang et al adeptly craed a bifunctional NiFe double-atom catalyst (DAC), which exhibited remarkable catalytic efficiency and steadfast durability in the context of acidic water electrolysis.…”
Section: Introductionmentioning
confidence: 99%
“…21 Taking the typical H as an example, the site-H bonding strength is usually as an index to evaluate the H-concerned reactions such as photocatalytic H 2 evolution, electrocatalytic H 2 evolution, and heterogeneous hydrogenation. [39][40][41] The widely researched defect-laden indium oxides (In 2 O 3−x (OH) y ) are typical frustrated Lewis pairs (FLPs), on which heterolytic dissociation of H 2 could easily proceed with the formation of In-OH þ 2 ⋯In-H − through s-s orbital coupling. 42 With the neighboring site substitution by Bi element over In 2 O 3−x (OH) y , such FLPs sites exhibit a simultaneous improvement both in the basicity and acidity.…”
Section: S-s S-p and S-d Orbital Interactionsmentioning
confidence: 99%