We report investigations of the hole transport in arrays of Ge quantum dots buried in Si. Based on measurements of the temperature dependence of the conductance, the charge-transfer mechanism is proposed to be due to variable-range hopping between the dots with the typical hopping energy determined by inter-dot Coulomb interaction. We find that putting a metal plane close to the dot layer causes a crossover from Efros-Shklovskii variable-range hopping conductance to two-dimensional Mott behavior as the temperature is reduced. At the crossover temperature the hopping activation energy is observed to fall off. The experimental results are explained by screening of long-range Coulomb potentials and give evidence for strong electrostatic interaction between dots in the absence of screening. Conductance oscillations with gate voltage resulting from successive loading of holes into the dots are observed in the field-effect structures.Introduction Variable-range hopping (VRH) is a general conduction mechanism in systems with strongly localized carriers at sufficiently low temperatures. In a regime of VRH, the hopping distance increases as temperature is lowered and the temperature dependence of conductivity is given by sT s 0 exp ÀT 0 aT x , where, in the twodimensional case in the absence of long-range Coulomb interaction, the exponent x 1a3 and T 0 T M G gE F x 3 À1 (Mott VRH), gE F being the density of states in the vicinity of the Fermi level E F and x is the localization radius. If the interaction energy of a displaced electron and the hole it leaves behind is large compared with disorder energies, the conductivity is decribed by the Efros-Shklovskii (ES) law with x 1a2 and T 0 T ES G e 2 aE r x, where E r is the relative permittivity. In this paper, we describe a set of experiments in which we have studied hopping transport in Si metal-oxide±semiconductor field effect structures containing a two-dimensional array of Ge self-assembled quantum dots (QDs) as a conductive channel. The dots are separated from each other by silicon, and the only conduction mechanism at low temperatures is tunnelling of holes between them. The pseudomorphic Ge islands grown epitaxially on a Si (001) surface exhibit a large band discontinuity in the valence band and can be viewed as doping`artificial atoms'. They provide a system in which the number of holes confined in three dimensions, the structure of the hole energy levels, the shape of wavefunctions, and the strength of Coulomb interaction can be controlled. First, we discuss samples in which the holes on the dots are supplied by a