SDTrimSP-2D studies of the influence of mutual flux arrangement on erosion and deposition

Mutzke, A.; Schneider, R.; Bizyukov, Ivan

doi:10.1016/j.jnucmat.2009.01.133

Cited by 31 publications

(41 citation statements)

References 9 publications

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“…We have also previously looked at the C + bombardment case in a situation (42º parallel to the structure) dominated by sputtering [11a]. In addition, the code has been used to evaluate the effect of the surface roughness on W exposed to C + [12] and C + +D + fluxes [13].…”

Section: Introductionmentioning

confidence: 99%

Nano-scale modification of 2D surface structures exposed to 6keV carbon ions: Experiment and modeling

Mutzke

Bizyukov

Schneider

et al. 2011

Nuclear Instruments and Methods in Physics Research Section B:

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In this work, a Si pitch grating with typical lateral dimensions of 200-250 nm was exposed to 6 keV C + ions at normal incidence and at an angle of 42° both parallel and perpendicular to the grating structure. In contrast to volatile and recycling ions (like Ar + or H + ), non-recycling ions are able to modify the surface not only due to sputtering, but also due to implantation of incident ions and the re-deposition of projectile atoms following sputtering or reflection. The targetprojectile combination used in this work is an example of such a system forming a mixed Si-C surface. The interaction between the ion beam and the surface has been studied both experimentally and numerically with the focus on validation of the numerical model of the newly developed SDTrimSP-2D code. SDTrimSP-2D is capable of following the evolution of the Si-C system including ion-surface interactions with 2D micro-and nano-structured surfaces. The SDTrimSP-2D code takes the interdependency of surface morphology, sputtering and implantation into account. The simulated surface morphology has been compared to crosssections of bombarded Si pitch grating obtained by SEM, revealing good agreement between experiment and simulation. The calculations also provide improved insight into the mechanisms of surface modification by sputtering, implantation and material transport by redeposition.Keywords: SDTrimSP-2D, sputtering, implantation, redeposition, surface morphology, local ion-surface interactions. IntroductionSputtering of a surface exposed to a flux of energetic ions is one of the most studied effects of ion-surface interactions [1]. However, the details of ion-surface interactions depend greatly on the target-projectile combination. In cases where the projectile is an ion of a volatile (recycling) element, sputtering is usually the dominant process and the surface is eroded. In such cases, experiments are well described theoretically, at least for relatively smooth surfaces. The sputtering yield is the main parameter, which has been used to validate theoretical models with experiments. Existing models like the TRIM code show good agreement with experiment for many target-projectile combinations.

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Section: Introductionmentioning

confidence: 99%

Nano-scale modification of 2D surface structures exposed to 6keV carbon ions: Experiment and modeling

Mutzke

Bizyukov

Schneider

et al. 2011

Nuclear Instruments and Methods in Physics Research Section B:

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“…Cu) taking into account the dynamical changes within the target due to the bombardment and calculates various physical quantities like sputtering yield, energy and angular distribution of the sputtered flux and the depth profiles of different species in the target. SDTrimSP-2D is a 2-D extension of SDTrimSP [8], which, in turn, is a generalized version of the TRIDYN program [6], [9]. It can be run in static or dynamic mode (SD) on sequential or parallel systems (SP).…”

Section: Modelmentioning

confidence: 99%

Operational limit of a planar DC magnetron cluster source due to target erosion

Rai¹,

Mutzke²,

Bandelow³

et al. 2013

Nuclear Instruments and Methods in Physics Research Section B:

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The binary collision-based two dimensional SDTrimSP-2D model has been used to simulate the erosion process of a Cu target and its influence on the operational limit of a planar DC magnetron nanocluster source. The density of free metal atoms in the aggregation region influences the cluster formation and cluster intensity during the target lifetime. The density of the free metal atoms in the aggregation region can only be predicted by taking into account (i) the angular distribution of the sputtered flux from the primary target source and (ii) relative downwards shift of the primary source of sputtered atoms during the erosion process. It is shown that the flux of the sputtered atoms smoothly decreases with the target erosion.

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“…Both Monte-Carlo Codes are a very valuable tool for analyzing ion-solid interactions like implantation, backscattering, transmission, sputtering and composition changes of the ion-bombarded amorphous solid. They are mainly used in fusion research to calculate erosion at the reactor wall or the divertor [6]. With the two-dimensional version the influence of a surface structure on the interaction of the incoming particles and the target compounds can be determined.…”

Section: Monte-carlo Code For Analyzing Ion-solid Interactionsmentioning

confidence: 99%

“…In particular, the time-dependent process of the layer closure above the cavities is of special interest. These studies were carried out by means of numerical simulations using the Monte-Carlo Code SDTrimSP-2D [1]. Compared to former simulation codes, this one offers the possibility of including the impacting high-energetic ions in the process on the substrate surface and, therewith, indirectly the effect of the substrate bias.…”

mentioning

confidence: 99%

Mechanisms of layer growth in microwave-PECVD silan plasmas – Experiment and simulation

Ramisch

Mutzke

Schneider

et al. 2013

Nuclear Instruments and Methods in Physics Research Section B:

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For the specific manipulation of barrier-layer properties, a detailed analysis of the layer-growth mechanisms in microwave-PECVD was carried out for Si-wafers with a trench structure as "model cavities" in the µm range. The deposition of a-Si:H (hydrogenated amorphous silicon) layers in pure monosilane plasmas was used as model system to compare experimental results and simulations using the 2D binary collision code SDTrimSP-2D, which showed very good agreement with the experiment. Without bias the layer tends to close above the cavities from both sides, but cracks remain at the closure positions. By biasing the substrate a smoothing of the layer edges above the cavities occurred. Thus, the cavities remained open for a longer time and a more homogeneous coating of the notches is obtained.

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SDTrimSP-2D studies of the influence of mutual flux arrangement on erosion and deposition

Cited by 31 publications

References 9 publications

Nano-scale modification of 2D surface structures exposed to 6keV carbon ions: Experiment and modeling

Nano-scale modification of 2D surface structures exposed to 6keV carbon ions: Experiment and modeling

Operational limit of a planar DC magnetron cluster source due to target erosion

Mechanisms of layer growth in microwave-PECVD silan plasmas – Experiment and simulation

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