Searching for the starting approximation when solving inverse problems in ellipsometry and spectrophotometry

Ayupov, B. M.; Зарубин, И. А.; Лабусов, В. А.; Sulyaeva, V. S.; Shayapov, V. R.

doi:10.1364/jot.78.000350

Cited by 16 publications

(9 citation statements)

References 4 publications

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“…The thicknesses and the refractive indices of the films can be calculated using the spectrophotometric method of reflection at two angles of incidence [15]. This method is only applicable to the spectral region in which the film is transparent or its absorption is sufficiently low for being neglected.…”

Section: Resultsmentioning

confidence: 99%

“…The key physical parameters that determine the properties of the films and their suitability for specific applications are [1,2,[7][8][9][10][11][12][13][14][15]: film refractive index (n f ), film thickness (d f ) and film absorption, that is expressed through the absorption index (α f , cm -1 ) [16,17] or the extinction coefficient κ f [16,[18][19][20] which are in the following relationship:…”

Section: Introductionmentioning

confidence: 99%

“…Film thickness and refractive index are measured with nondestructive spectrophotometric methods. It has been reported [1,4,6,[13][14][15][22][23][24] that both the refractive n index and the thickness of films can be retrieved by analyzing the maxima and minima in the spectra of film transmittance (T, %) or reflectance (R, %) originating from light interference in the plane-parallel layer (film). However film absorption measurements are a more complex task.…”

Section: Introductionmentioning

confidence: 99%

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Multi-angle spectrophotometry as a tool for determination of film parameters on single-layer structures

Козлова

Левашов

Kiryukhantsev-Korneev

et al. 2022

MoEM

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Ta–Si–C–N single-layer films have been synthesized by direct current magnetron sputtering on fused quartz substrates. The structural perfection of the films has been studied using X-ray diffraction, scanning electron microscopy and glow discharge optical emission spectroscopy. The optical parameters of the films have been studied using multi-angle spectrophotometry. The spectral dependences of the transmission coefficients of substrates and structures were measured for normal incidence of light in the wavelength range 200–2500 nm. We show that the transmittance spectrum of the specimen has an oscillating pattern due to interference phenomena that are typical for layered structures. The reflectance of the films and the substrates has been measured in the 200–2500 nm region for small incidence angles. The difference between the reflection coefficient at the maximum of the interference of the film and the corresponding reflection coefficient of the substrate at the same wavelength shows that the absorption in the film is low. A formula for determination of the film absorption index based on the measured parameters has been derived. The experimental and calculated data have been used for plotting the absorption spectra of the substrate, structure and film. Discrete refractive indices in the 400–1200 nm region have been calculated for reflections at two incidence angles by determining the positions of interference maxima in the reflectivity spectral responses. The results have been approximated using the Cauchy equation. The film thickness has been estimated to be df = 1046 nm ± 13%. The spectra of film extinction coefficients have been plotted with and without allowance for reflection. Obtained values of the refractive and absorption indices with and without reflection have been summarized in a table.

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Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Multi-angle spectrophotometry as a tool for determination of film parameters on single-layer structures

Козлова

Левашов

Kiryukhantsev-Korneev

et al. 2022

MoEM

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“…Па-раметры поляризации отраженного света ψ и Δ были измерены в диапазоне углов падения света на образец от 50° до 80° с шагом 5°, длина волны света -632,8 нм. Методика поиска начальных приближений и решения обратной задачи эллипсометрии представлена в работах [15,16].…”

Section: экспериментальная частьunclassified

Gas-abrasive wear resistance of silicon and boron carbonitride films

Shayapov¹,

Sulyaeva²,

Rumyantsev³

et al. 2017

LoM

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Gas-abrasive wear resistance of silicon carbonitride SiC x N y H z and boron carbonitride BC x N y films obtained by chemical vapor deposition (CVD) method was studied. Wear resistance tests were carried out in a flux of sand particles falling on the samples under the gravity action. Scanning electron microscopy, scanning probe microscopy, ellipsometry and spectrophotometry were used to detect the surface modifications occurred during this treatment. In addition, early published data on the physical and chemical properties of the films are involved for interpreting the results of gas-abrasive tests. The SiC x N y H z films were obtained by plasma-enhanced CVD from the mixture of hexamethyldisilazane vapor and helium at deposition temperatures 100 -800°C and pressure 0.05 Torr. It was found that gas-abrasive wear resistance of the films increased with the deposition temperature due to the changes in a chemical composition of the films towards the hard SiC x N y material. BC x N y films were synthesized by low-pressure CVD from triethylamine borane vapor and its mixture with ammonia (ratio of partial pressures 1 : 1). Deposition temperature was 700°C. There is a difference in destruction mechanisms of the films deposited from these compositions of the initial gas mixture. The surface of films synthesized from triethylamine borane vapor and treated with sand particles shows destroyed and undamaged areas similar to the SiC x N y H z films. When ammonia is added to the initial gas mixture, the surface of the treated films acquires a specific appearance with lots of scratches. These changes are associated with a decrease in the hardness and Young's modulus of the BC x N y films due to the nitrogen concentration enhancement.

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“…Excitation was organized from the side of the Al x Ga 1Àx N layer. The optical emission coming from samples was recorded and analyzed with the help of a multi-channel spectrometer 30 (spectral range of 200-650 nm) or, alternatively, with the help of an MDR 23 monochromator (investigated spectral region 600-1500 nm). During the experiments, the structures were kept in inert atmosphere under a pressure defined by the particular operating regime of a particular EB source.…”

Section: B Electron Beam Sources and Spectral Measurementsmentioning

confidence: 99%

Luminescence and superradiance in electron-beam-excited AlxGa1−x N

Бохан¹,

Гугин²,

Zakrevsky³

et al. 2014

Journal of Applied Physics

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Searching for the starting approximation when solving inverse problems in ellipsometry and spectrophotometry

Cited by 16 publications

References 4 publications

Multi-angle spectrophotometry as a tool for determination of film parameters on single-layer structures

Multi-angle spectrophotometry as a tool for determination of film parameters on single-layer structures

Gas-abrasive wear resistance of silicon and boron carbonitride films

Luminescence and superradiance in electron-beam-excited AlxGa1−x N

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Searching for the starting approximation when solving inverse problems in ellipsometry and spectrophotometry

Cited by 16 publications

References 4 publications

﻿Multi-angle spectrophotometry as a tool for determination of film parameters on single-layer structures

﻿Multi-angle spectrophotometry as a tool for determination of film parameters on single-layer structures

Gas-abrasive wear resistance of silicon and boron carbonitride films

Luminescence and superradiance in electron-beam-excited AlxGa1−x N

Contact Info

Product

Resources

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Multi-angle spectrophotometry as a tool for determination of film parameters on single-layer structures

Multi-angle spectrophotometry as a tool for determination of film parameters on single-layer structures