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Erley, G.; Butz, R.; Daum, W.

doi:10.1103/physrevb.59.2915

Cited by 38 publications

(37 citation statements)

References 27 publications

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“…9 However, this approximation has proven to be useful for other transitions as well. 5,7,8,50 For the approximation in Eq. ͑12͒, it is assumed that the SHG response is resonant at the SHG photon energy with the fundamental photon energy far from a resonance.…”

Section: B Microscopic Originmentioning

confidence: 99%

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Optical second-harmonic generation in thin film systems

Gielis

Gevers

Aarts

et al. 2008

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Document VersionPublisher's PDF, also known as Version of Record (includes final page, issue and volume numbers) Please check the document version of this publication:• A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and page numbers. Link to publication General rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.• Users may download and print one copy of any publication from the public portal for the purpose of private study or research.• You may not further distribute the material or use it for any profit-making activity or commercial gain • You may freely distribute the URL identifying the publication in the public portal ? Take down policyIf you believe that this document breaches copyright please contact us providing details, and we will remove access to the work immediately and investigate your claim. The surface and interface sensitive nonlinear optical technique of second-harmonic generation ͑SHG͒ is a very useful diagnostic in studying surface and interface properties in thin film systems and can provide relevant information during thin film processing. An important aspect when applying SHG is the interpretation of the SHG response. In order to utilize the full potential of SHG during materials processing it is necessary to have a good understanding of both the macroscopic and the microscopic origin of the SHG response, particularly in thin film or multilayer systems where the propagation of radiation is another important aspect that should be considered carefully. A brief theoretical overview on the origin of the SHG response and a description of the propagation of radiation will be given. Furthermore, several methods will be discussed that might reveal the possible macroscopic and microscopic origins of the SHG response in thin film systems. The different approaches will be illustrated by examples of real-time and spectroscopic SHG experiments with thin film systems relevant in Si etching and deposition environments, such as ͑1͒ hydrogenated amorphous Si films deposited by hot-wire chemical vapor deposition on both Si͑100͒ and fused silica substrates, ͑2͒ amorphous Si generated by low-energy Ar + -ion bombardment of H terminated Si͑100͒, and ͑3͒ Al 2 O 3 films deposited by plasma-assisted atomic layer deposition on H terminated Si͑100͒.

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Section: B Microscopic Originmentioning

confidence: 99%

“…Erley et al 50 developed a theory to decompose spectroscopic SHG data into a number of separate resonant contributions. In this approach the spectroscopic SHG intensity is reproduced by 18,50 …”

Section: B Microscopic Originmentioning

confidence: 99%

Optical second-harmonic generation in thin film systems

Gielis

Gevers

Aarts

et al. 2008

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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“…The SHG intensity at a photon energy E ph = 3.4 eV is dominated by field-induced second harmonic generation and is therefore a reasonable measure of the field-effect passivation. 62 As shown by Terlinden et al differences in the field-effect passivation of Al 2 O 3 films can be analyzed with SHG measurements. 66 In Fig.…”

Section: Resultsmentioning

confidence: 99%

“…created by the Q f of passivation films. 62 The amplitude of the SHG intensity of the peak centered at the SHG photon energy of 3.4 eV is a measure for the electric-field at the Si surface when probing Si surfaces covered by dielectric films such as Al 2 O 3 . • C, i.e.…”

Section: Methodsmentioning

confidence: 99%

Surface Passivation by Al₂O₃anda-SiN_x: H Films Deposited on Wet-Chemically Conditioned Si Surfaces

Bordihn

Mertens

Engelhart

et al. 2012

ECS J. Solid State Sci. Technol.

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“…In order to separate different contributions to the SHG response, the spectra have been reproduced using a model in which the SHG intensity is approximated by a coherent superposition of CP-Iike resonances with excitonic line shapes evaluated at the substrate/film interface [22,25,26] /(2w) = IAzzz(w,B)fX~~,qr li~(w) (2) describes the propagation of the fundamental and SHG radiation in the film-substrate system. This film thickness dependent function includes linear optical effects, such as 000428 absorption, refraction, and interference due to multiple reflections within the AI 203 films [22].…”

Section: Resultsmentioning

confidence: 99%

Electric field induced surface passivation of Si by atomic layer deposited Al<inf>2</inf>O<inf>3</inf> studied by optical second-harmonic generation

Kessels

Gielis

Hoex

et al. 2009

2009 34th IEEE Photovoltaic Specialists Conference (PVSC)

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Second-harmonic spectroscopy of interband excitations at the interfaces of strainedSi(100)−Si0.85Ge

Cited by 38 publications

References 27 publications

Optical second-harmonic generation in thin film systems

Optical second-harmonic generation in thin film systems

Surface Passivation by Al₂O₃anda-SiN_x: H Films Deposited on Wet-Chemically Conditioned Si Surfaces

Electric field induced surface passivation of Si by atomic layer deposited Al<inf>2</inf>O<inf>3</inf> studied by optical second-harmonic generation

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Second-harmonic spectroscopy of interband excitations at the interfaces of strainedSi(100)−Si0.85Ge

Cited by 38 publications

References 27 publications

Optical second-harmonic generation in thin film systems

Optical second-harmonic generation in thin film systems

Surface Passivation by Al2O3anda-SiNx: H Films Deposited on Wet-Chemically Conditioned Si Surfaces

Electric field induced surface passivation of Si by atomic layer deposited Al<inf>2</inf>O<inf>3</inf> studied by optical second-harmonic generation

Contact Info

Product

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Surface Passivation by Al₂O₃anda-SiN_x: H Films Deposited on Wet-Chemically Conditioned Si Surfaces