“…Those interfaces can significantly affect the AFM texture development (and the corresponding AFM pinning field and blocking temperature), SAF coupling strength, interface spin-dependent electron scattering, and thus the achievable overall GMR performance. For example, it has been found that the seed layer material selection [9][10][11][12][13], critical seed layer thickness [10,11,14], oxygen impurity content [15] had strong impact on the AFM texture growth, its grain size, and the corresponding GMR ratio of the film stack. Background impurity effect can be more profound when high oxygen-affinity seed layer (like Ta) is used.…”