2002
DOI: 10.1007/s10582-002-0042-z
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Segregation effect on nanocrystalline La(Ni,Al)5 surface

Abstract: Nanocrystalline La(Ni,A1)5 alloys were prepared by mechanical alloying (MA) followed by annealing. Results showed that the surface segregation of La atoms in the MA nanocrystalline samples is stronger compared to that of polycrystalline materials from re'c-melted ingots. Small amounts of Fe impurities, which strongly segregate to the surface, could influence on the hydrogenation properties of the MA nanocrystalline alloys. PACS: 71.20.BeLaNih-based materials combine a high reversible energy storage capacity wi… Show more

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Cited by 7 publications
(3 citation statements)
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“…In previous papers [15,16] we have reported a strong segregation of the La atoms to the surfaces in mechanically alloyed bulk nanocrystalline LaNi 5 -type alloys under ambient conditions. However, the XPS studies performed immediately after deposition showed no remarkable segregation of La atoms to the surface in nanocrystalline or polycrystalline La-based alloy thin films (see Figs.…”
Section: Resultsmentioning
confidence: 85%
“…In previous papers [15,16] we have reported a strong segregation of the La atoms to the surfaces in mechanically alloyed bulk nanocrystalline LaNi 5 -type alloys under ambient conditions. However, the XPS studies performed immediately after deposition showed no remarkable segregation of La atoms to the surface in nanocrystalline or polycrystalline La-based alloy thin films (see Figs.…”
Section: Resultsmentioning
confidence: 85%
“…Results on XRF measurements revealed the assumed bulk chemical composition of the microcrystalline and nanocrystalline LaNi 5 -type thin films and bulk materials. However, in the previous paper [18] we have reported a strong segregation of the La atoms to the surfaces in MA (bulk) nanocrystalline La(Ni,Al) 5 alloy.…”
Section: Lani 5 -Type Alloysmentioning
confidence: 75%
“…The chemical composition and the cleanness of all layers were checked in situ, immediately after deposition, transferring the samples to an UHV (4 × 10 −11 mbar) analysis chamber equipped with XPS, Auger electron spectroscopy (AES) and ion gun etching system [23][24][25][26][27]. The XPS spectra were measured at room temperature using a SPECS EA 10 PLUS energy spectrometer with Al K α and Mg K α radiation of 1486.6 eV and 1253.6 eV, respectively.…”
Section: Introductionmentioning
confidence: 99%