2000
DOI: 10.1002/1521-3757(20001103)112:21<4082::aid-ange4082>3.0.co;2-k
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Selbstreparierende DNA basierend auf einem reduktiven Elektronentransfer durch den Basenstapel

Abstract: Lichtinduzierte Selbstreparatur wird beobachtet in DNA‐Strängen, die mit einem Flavinrest und einem UV‐Licht‐induzierten Schaden modifiziert wurden. Die Grundlage für die Reparatur ist ein lichtgetriebener Elektronentransfer vom Flavinrest zum Dimerschaden (siehe schematische Darstellung). Dieser Prozess findet sogar statt, wenn der DNA‐Schaden und der Flavinrest durch ein Basenpaar getrennt sind.

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Cited by 15 publications
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“…The large excess of NADH with respect to the flavin (20:1-2000:1), as well as the lack of flavin fluorescence below 470 nm and the limited absorption of the flavin between 290-350 nm, prevents flavin absorption/fluorescence from interfering under the assay conditions used. [15,16] In Figure 2 is shown the effect on NADH oxidation at 25 8C of adding increasing amounts of 5, a 41-mer oligonucleotide containing a 20-mer sequence complementary to that of 3, to a 10 mm solution of conjugate 3. We determined a melting temperature (T m ) value of 62 8C for the 3:5 duplex under the conditions of the assay and verified that the presence of Fre has no effect on this value.…”
mentioning
confidence: 99%
“…The large excess of NADH with respect to the flavin (20:1-2000:1), as well as the lack of flavin fluorescence below 470 nm and the limited absorption of the flavin between 290-350 nm, prevents flavin absorption/fluorescence from interfering under the assay conditions used. [15,16] In Figure 2 is shown the effect on NADH oxidation at 25 8C of adding increasing amounts of 5, a 41-mer oligonucleotide containing a 20-mer sequence complementary to that of 3, to a 10 mm solution of conjugate 3. We determined a melting temperature (T m ) value of 62 8C for the 3:5 duplex under the conditions of the assay and verified that the presence of Fre has no effect on this value.…”
mentioning
confidence: 99%