Selected Area Deposition of High Purity Gold for Functional 3D Architectures

Lasseter, John; Rack, Philip D.; Randolph, Steven

doi:10.3390/nano13040757

Cited by 4 publications

(3 citation statements)

References 58 publications

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“…[7,8] However, the spatial resolution achievable through this method is typically restricted by the wavelength of the laser light employed. Although there has been recent evidence that this issue can be addressed in thermally decoupled 3D gold structures, [9] the range of achievable structure geometries remains restricted. This is also applicable to local energy input through resistive heating.…”

Section: Introductionmentioning

confidence: 99%

Area‐Selective Chemical Vapor Deposition of Gold by Electron Beam Seeding

Tsarapkin,

Maćkosz,

Jureddy

et al. 2024

Advanced Materials

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Chemical vapor deposition (CVD) is an established method for producing high‐purity thin films, but it typically necessitates the pre‐ and post‐processing using a mask to produce structures. This paper presents a novel maskless patterning technique that enables area selective CVD of gold. A focused electron beam is used to decompose the metal‐organic precursor Au(acac)Me2 locally, thereby creating an autocatalytically active seed layer for subsequent CVD with the same precursor. The procedure could be included in the same CVD process without the need for clean room lithographic processing. Moreover, it operates at low temperatures of 80 °C, over 200 K lower than standard CVD temperatures for this precursor, reducing thermal load on the specimen. Given that electron beam seeding operates on any even moderately conductive surface, the process does not constrain device design. This is demonstrated by the example of vertical nanostructures with high aspect ratios of around 40:1 and more. Written using a focused electron beam and the same precursor, these nanopillars exhibit catalytically active nuclei on their surface. Furthermore, by using the onset of the autocatalytic CVD growth, for the first time the local temperature increase caused by the writing of nanostructures with an electron beam could be precisely determined.This article is protected by copyright. All rights reserved

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Section: Introductionmentioning

confidence: 99%

Area‐Selective Chemical Vapor Deposition of Gold by Electron Beam Seeding

Tsarapkin,

Maćkosz,

Jureddy

et al. 2024

Advanced Materials

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“…The most commonly used FEBID approach is gas phase electron beam induced deposition. The process has been employed to create metallic deposits, including silver, , gold, copper and ruthenium, and has been combined with other deposition techniques to create 3D complex structures. , Gas phase FEBID, however, suffers from low growth rate and impurities due to parasitic carbon entrapment . Recent reviews provide a comprehensive overview of the advancements and challenges associated with gas phase FEBID, highlighting various strategies to mitigate these issues and improve the quality and efficiency of the deposition process .…”

Section: Introductionmentioning

confidence: 99%

“…The most commonly used FEBID approach is gas phase electron beam induced deposition. The process has been employed to create metallic deposits, including silver, 5 , 6 gold, 7 copper 8 and ruthenium, 9 and has been combined with other deposition techniques to create 3D complex structures. 10 , 11 Gas phase FEBID, however, suffers from low growth rate and impurities due to parasitic carbon entrapment.…”

Section: Introductionmentioning

confidence: 99%

Electrochemical Lensing for High Resolution Nanostructure Synthesis in Liquids

Ahmed,

Kottke,

Fedorov

2024

ACS Appl. Nano Mater.

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The advancement of liquid phase electron/ion beam induced deposition has enabled an effective direct-write approach for functional nanostructure synthesis with the possibility of three-dimensional control of morphology. For formation of a metallic solid phase, the process employs ambient temperature, beam-guided, electrochemical reduction of precursor cations, resulting in rapid formation of structures, but with challenges for retention of resolution achievable via slower electron beam approaches. The possibility of spatial control of redox pathways via the use of water−ammonia solvents has opened avenues for improved nanostructure resolution without sacrificing the growth rate. In particular, ammonia enables "electrochemical lensing" in which a tightly confined and highly reducing environment is created locally to enable high resolution, rapid beam-directed nanostructure growth. We demonstrate this unique approach to high resolution synthesis through a combination of analysis and experiment.

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A Review on Direct‐Write Nanoprinting of Functional 3D Structures with Focused Electron Beams

Reisecker,

Winkler,

Plank

2024

Adv Funct Materials

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Following Moore`s law, the performance of devices should double within a two‐year span, which can either be done by reducing the size of the individual components or adapting the working mechanism. In most cases the same mantra applies – pushing the size while keeping the quality. As manufacturing techniques are approaching the atomic scale, however, miniaturization reaches its intrinsic limit, shifting focus toward higher‐dimensional architectures realized by stacking planar layers or fabricating true, free‐standing nanostructures. A mask‐less, additive manufacturing technique with the capability to produce such 3D structures at the nanoscale is called Focused Electron Beam Induced Deposition (FEBID). Applying a focused electron beam in a conventional scanning electron microscope together with a gaseous metal‐precursor gives access to a vast library of complex, 3D nanostructures, which exhibit feature sizes down to the 10 nm‐range and can be printed in a single step on most substrates. This review aims at introducing the technique to a broader scientific community, breaking down the most important processing routes and highlighting disciplines explored so far ranging from nanooptics and nanomagnetism, over scanning probes and field emitters to sensing and particle trapping. Finally, a future roadmap of the technique is discussed, and prospective research focus identified.

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Selected Area Deposition of High Purity Gold for Functional 3D Architectures

Cited by 4 publications

References 58 publications

Area‐Selective Chemical Vapor Deposition of Gold by Electron Beam Seeding

Area‐Selective Chemical Vapor Deposition of Gold by Electron Beam Seeding

Electrochemical Lensing for High Resolution Nanostructure Synthesis in Liquids

A Review on Direct‐Write Nanoprinting of Functional 3D Structures with Focused Electron Beams

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