2018
DOI: 10.1016/j.matlet.2018.02.062
|View full text |Cite
|
Sign up to set email alerts
|

Selective electroless metallization of non-conductive substrates enabled by a Fe3O4/Ag catalyst and a gradient magnetic field

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1

Citation Types

0
4
0

Year Published

2020
2020
2022
2022

Publication Types

Select...
3

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(4 citation statements)
references
References 13 publications
0
4
0
Order By: Relevance
“…The catalyst did not have any adhesion to the substrate, which resulted in poor adhesion of deposited copper. In our previous work [24] , that effect was not observed due to the use of a lower concentration of catalyst in the dispersion, which resulted in less catalyst deposited at the centre of the pattern (case 1).…”
Section: Deposition With Single Magnetmentioning
confidence: 83%
See 1 more Smart Citation
“…The catalyst did not have any adhesion to the substrate, which resulted in poor adhesion of deposited copper. In our previous work [24] , that effect was not observed due to the use of a lower concentration of catalyst in the dispersion, which resulted in less catalyst deposited at the centre of the pattern (case 1).…”
Section: Deposition With Single Magnetmentioning
confidence: 83%
“…Instead of an expensive precious metal palladium catalyst, a magnetic magnetite-silver composite catalyst was used. Although the SMMF method is at an early stage of development, previous work by our group has demonstrated the ability to achieve a selective pattern of parallel lines by using a magnet [24][25][26] .…”
Section: Introductionmentioning
confidence: 99%
“…The preparation of the conductive circuits is one of the most important steps in printed electronics industry, such as PCBs, FPCs, RFID tags, sensors, printed batteries, etc., where low circuit resistance, large area, high production efficiency, and low cost are needed. Subtractive process is the traditional way to prepare conductive circuits in which the metal-clad substrate is first masked by photoresist via photolithography followed by etching the exposed metal to keep the designed conductive patterns . Obviously, the subtractive process is wasteful in material, harmful to the environment, and limited in line width and substrates . Large amounts of liquid waste loaded with toxic heavy metal ions and organics were produced in etching and photolithography steps, causing environmental disaster if discharged directly.…”
Section: Introductionmentioning
confidence: 99%
“…4 Obviously, the subtractive process is wasteful in material, harmful to the environment, and limited in line width and substrates. 5 Large amounts of liquid waste loaded with toxic heavy metal ions and organics were produced in etching and photolithography steps, causing environmental disaster if discharged directly. Moreover, the undercut of the conductive circuits occurred during wet etching is inevitable, resulting in the low yield of producing ultrafine circuits (lower than 35 μm 6−8 ), limiting the further miniaturization of the electronic devices.…”
Section: Introductionmentioning
confidence: 99%