Selective Incorporation of Perfluorinated Phenyl Rings during Pulsed Plasma Polymerization of Perfluoroallylbenzene

Hynes, A.; Badyal, J. P. S.

doi:10.1021/cm9800682

Cited by 28 publications

(27 citation statements)

References 46 publications

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“…Here in the case of butylacrylate, XPS, FTIR and refractive index measurements clearly demonstrate that pulsed plasma polymerization produces films which resemble conventional solution phase polymerized poly(butylacrylate). The high deposition efficiency observed during pulsed plasma deposition is consistent with free radical polymerization occurring during the electrical discharge off-period [10,28].…”

Section: Discussionsupporting

confidence: 66%

Pulsed Plasma Polymerisation of Butylacrylate for Pressure-Sensitive Adhesion

Schofield

Badyal

2006

Plasma Chem Plasma Process

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Section: Discussionsupporting

confidence: 66%

Pulsed Plasma Polymerisation of Butylacrylate for Pressure-Sensitive Adhesion

Schofield

Badyal

2006

Plasma Chem Plasma Process

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“…Moreover, the choice of various reactive functional groups is possible in order to get covalent bonds with the elastomer during crosslinking. Plasma polymer thin coatings are generally recognized as well adhering coatings to all substrates which can improve corrosion resistance of metals as well as adhesive performance [4][5][6][7][8]. The deposition of the plasma thin coating is a clean process without any solvent.…”

Section: Introductionmentioning

confidence: 99%

Strengthening the Junction Between EPDM and Aluminium Substrate via Plasma Polymerisation

Roucoules¹,

Siffer²,

Ponche³

et al. 2007

The Journal of Adhesion

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High interfacial strengths of elastomer to metal joints imply the formation of covalent bonds at the interface. It is proposed to deposit a plasma polymer coating containing double bonds on an aluminium substrate for the formation of crosslinks between the elastomer and the coating during peroxide crosslinking of the elastomer. Ethylene-co-propylene-co-diene terpolymer (EPDM) is considered here. Maleic anhydride is polymerised and reacted with allylamine to lead to an amide functionalised plasma polymer which is heated to produce imide functional groups. Plasma polymer coated aluminium=EPDM joints were evaluated by a peel test and the locus of failure was identified by several techniques: SEM, infrared spectroscopy, wettability, and XPS.

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“…Radicals formed from other radicals via homogenous and heterogeneous propagation reactions should not influence deposition profiles in the reactor, and can be neglected. This is further supported by the fact that mass spectroscopic [12] and X-ray photoelectron spectroscopic studies [13] performed in plasmas of organic gases, indicate no significant formation of oligomeric species by free radical reactions in the plasma phase. The mathematical model could thus be assembled by considering the radicals as a single active species and the acetylene monomer itself as the second species.…”

Section: A Development Of the Mass Transport Equationsmentioning

confidence: 73%

Mass transport characteristics in a pulsed plasma enhanced chemical vapor deposition reactor for thin polymer film deposition

Goyal

Mahalingam²,

Pedrow³

et al. 2001

IEEE Trans. Plasma Sci.

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A pulsed plasma enhanced chemical vapor deposition (PECVD) reactor is used for the preparation of thin polyacetylene films. A theoretical model based on the mass transport characteristics of the reactor is developed in order to correlate with experimentally obtained spatial deposition profiles for the acetylene plasma polymer film deposited within the cylindrical reactor. Utilizing a free radical mechanism with gas phase initiation of the polymerization reaction as the rate controlling step, a system parametric study is performed to predict the Peclet number range of operation for the pulsed PECVD reactor. This parametric study indicates radical decay by diffusion to the reactor walls to be the significant physical phenomenon in the system. It is concluded that a quasi-steady-state model is a good tool for predicting the important mass transfer phenomena occurring in the pulsed plasma reactor. Index Terms-Damkohler and Peclet numbers, plasma polymer, radical decay, thin film. I. INTRODUCTION P LASMA processing techniques for thin film deposition have gained increasing importance in the semiconductor industry due to the advantages of lower processing temperatures as well as the wider parameter choices they provide for the manipulation of desirable film properties. The mechanism of plasma-induced chemical reactions is quite complex, with the physical and chemical properties of the deposited film being influenced by a large number of system parameters. These include, for example, the type of electrical discharge, reactor geometry, substrate characteristics, substrate potential, substrate location with respect to the plasma, plasma energy density, and operating pressure [1]. Because of such variety and complexity, plasma processing is often practiced as an art, with the theoretical developments, if any, usually following way behind. This paper describes, for our studies on the polymerization of acetylene in a pulsed PECVD reactor, a mass transport model developed in order to predict spatial deposition profiles for the polymer within the reactor.

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Selective Incorporation of Perfluorinated Phenyl Rings during Pulsed Plasma Polymerization of Perfluoroallylbenzene

Cited by 28 publications

References 46 publications

Pulsed Plasma Polymerisation of Butylacrylate for Pressure-Sensitive Adhesion

Pulsed Plasma Polymerisation of Butylacrylate for Pressure-Sensitive Adhesion

Strengthening the Junction Between EPDM and Aluminium Substrate via Plasma Polymerisation

Mass transport characteristics in a pulsed plasma enhanced chemical vapor deposition reactor for thin polymer film deposition

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