2021
DOI: 10.1088/1742-6596/2052/1/012051
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Selective oxidation of AlGaAs aperture layers of a Vertical-cavity surface-emitting laser with a generation wavelength of 850 nm

Abstract: A study of the technology of selective oxidation of the buried AlGaAs layer used as an aperture layer in the structure of a Vertical-cavity surface-emitting laser has been carried out. Oxidation process was made as thermal oxidating in a humidified nitrogen atmosphere. The conditions of the oxidation process are described, images of the oxidation results and the dependence of the growth rate of the oxidized layer on the process temperature are presented. A technology for the formation of an oxide current apert… Show more

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“…Additionally, the oxide aperture of the thin-film VCSEL is defined by lateral wet oxidation of AlGaAs using an electrical tube furnace. The 10-μm oxide-confined aperture can provide several merits such as the low resistance of upper DBR, the reduced recombination rate of the sidewalls near the cavity, and the less lateral current crowding outside the optical cavity 24 .
Figure 2 p-on-n structure of the thin-film VCSEL by MOCVD.
…”
Section: Resultsmentioning
confidence: 99%
“…Additionally, the oxide aperture of the thin-film VCSEL is defined by lateral wet oxidation of AlGaAs using an electrical tube furnace. The 10-μm oxide-confined aperture can provide several merits such as the low resistance of upper DBR, the reduced recombination rate of the sidewalls near the cavity, and the less lateral current crowding outside the optical cavity 24 .
Figure 2 p-on-n structure of the thin-film VCSEL by MOCVD.
…”
Section: Resultsmentioning
confidence: 99%