Abstract:This is one of the first attempts of making WO 3 thick film selective at low operating temperature by placing graphene sheets directly on the film surface. The WO 3 film was prepared by DC magnetron reactive sputtering of a pure tungsten target and annealing in air. The thickness of the film averaged 507 nm from FIB cross-sectioning and STEM measurement. The film was characterized with XRD, XPS and Raman spectroscopy. Graphene was synthesized on copper foil using plasma enhanced chemical vapor deposition of me… Show more
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