2016
DOI: 10.1063/1.4947099
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Self aligned hysteresis free carbon nanotube field-effect transistors

Abstract: Hysteresis phenomenon in the transfer characteristics of carbon nanotube field effect transistor (CNT FET) is being considered as the main obstacle for successful realization of electronic devices based on CNTs. In this study, we prepare four kinds of CNTFETs and explore their hysteretic behavior. Two kinds of devices comprise on-surface CNTs (type I) and suspended CNTs (type II) with thin insulating layer underneath and a single global gate which modulates the CNT conductance. The third and fourth types (type… Show more

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Cited by 13 publications
(5 citation statements)
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“…■ METHODS Device Fabrication. All CNT resonators were fabricated according to the local gate self-aligned technique reported in ref 35. Briefly, source and drain electrodes were patterned using standard e-beam lithography, and Cr/Pt 7/32 nm metal layers were evaporated.…”
Section: ■ Conclusionmentioning
confidence: 99%
“…■ METHODS Device Fabrication. All CNT resonators were fabricated according to the local gate self-aligned technique reported in ref 35. Briefly, source and drain electrodes were patterned using standard e-beam lithography, and Cr/Pt 7/32 nm metal layers were evaporated.…”
Section: ■ Conclusionmentioning
confidence: 99%
“…Device structure and experimental setup Figure 1a presents the geometric structure of our devices. The fabrication is based on the technique developed recently for self-aligned local-gate suspended CNT devices 21 . Briefly, CNTs are grown by chemical vapor deposition (CVD) to create a contact between the source and drain (SD) electrodes, while suspended above a local-gate electrode (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…We evaporated Cr/Pt 5/ 35 nm for the source and drain (SD) electrodes, after which we etched the SiO 2 using buffer oxide etchant (BOE) to create the local-gate trench (see supplementary text for details). Then, another step of Cr/Pt 5/35 nm evaporation was performed to create the self-aligned localgate 21 . Finally, we deposited a patterned ferritin catalyst near the SD electrodes for the CNT growth.…”
Section: Fabricationmentioning
confidence: 99%
“…5 and 7. This is due to the well known hysteretic shifting of the gate curves, which stems from impurities and defectrelated charges in the gate insulator and possibly the CNT itself [19]. The two measurements were performed at different cooling runs, whereby a shift in the position of the TG is understandable, since the hysteresis occurs at temperatures that allow ionic mobility.…”
Section: Other Conduction Phenomena Within the Transport Gapmentioning
confidence: 99%