Surface-engineered
nanostructured nonpolar (112̅0) gallium
nitride (GaN)-based high-performance ultraviolet (UV) photodetectors
(PDs) have been fabricated. The surface morphology of a nonpolar GaN
film was modified from pyramidal shape to flat and trigonal nanorods
displaying facets along different crystallographic planes. We report
the ease of enhancing the photocurrent (5.5-fold) and responsivity
(6-fold) of the PDs using a simple and convenient wet chemical-etching-induced
surface engineering. The fabricated metal–semiconductor–metal
structure-based surface-engineered UV PD exhibited a significant increment
in detectivity, that is, from 0.43 to 2.83 (×10
8
)
Jones, and showed a very low noise-equivalent power (∼10
–10
W Hz
–1/2
). The reliability of
the nanostructured PD was ensured via fast switching with a response
and decay time of 332 and 995 ms, which were more than five times
faster with respect to the unetched pyramidal structure-based UV PD.
The improvement in device performance was attributed to increased
light absorption, efficient transport of photogenerated carriers,
and enhancement in conduction cross section via elimination of recombination/trap
centers related to defect states. Thus, the proposed method could
be a promising approach to enhance the performance of GaN-based PD
technology.