2015
DOI: 10.1016/j.apsusc.2015.05.073
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Self-assembled monolayers of perfluoroalkylsilane on plasma-hydroxylated silicon substrates

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Cited by 35 publications
(15 citation statements)
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“…As shown in Figure 3G, AFM‐nanoFTIR spectra reveal that the regions in‐between the bumpy aggregates (gaps) in the CVD‐treated TP layers consisted of fluorinated material, as the characteristic IR signal showed CF stretching vibrations between 1000 and 1300 cm –1 , similar to that of the large aggregates and of the neat TP obtained by far‐field FTIR. [ 34 ] In contrast, IR signal from the incompletely silanized TP layer was different to that of the neat solution, indicating that the underlying silicon wafer contributed to the signal due to a patchy TP layer.…”
Section: Resultsmentioning
confidence: 99%
“…As shown in Figure 3G, AFM‐nanoFTIR spectra reveal that the regions in‐between the bumpy aggregates (gaps) in the CVD‐treated TP layers consisted of fluorinated material, as the characteristic IR signal showed CF stretching vibrations between 1000 and 1300 cm –1 , similar to that of the large aggregates and of the neat TP obtained by far‐field FTIR. [ 34 ] In contrast, IR signal from the incompletely silanized TP layer was different to that of the neat solution, indicating that the underlying silicon wafer contributed to the signal due to a patchy TP layer.…”
Section: Resultsmentioning
confidence: 99%
“… The C‐F band got overlapped with other characterization peaks of polyol appeared in the same region. However, 1 H NMR studies reveal that the appearance of (Si‐OCH 3 ) proton from PFS moiety at δ 3.57 and the vicinal proton of the CF 2 group at δ 2.11 confirms the formation of FSGPT‐ACP …”
Section: Resultsmentioning
confidence: 99%
“…However, the density of reactive hydroxyl groups on the native oxide layer surface is usually low due to the condensation of silanol groups (Si-OH) to form more stable siloxane groups (Si-O-Si) over time 52 . The most effective oxidation techniques for obtaining hydroxyl groups on siliconbased surfaces are oxygen plasma 53 , piranha solution (mixture of concentrated sulfuric acid and hydrogen peroxide at ratios from 3:1 to 7:3) 54 and UV/O 3 55 , although other oxidants such as sodium hydroxide 56 , nitric acid 57 and mixtures of ammonium chloride/hydrogen peroxide and hydrochloric acid/hydrogen peroxide 58 can be employed. The silanisation procedure is carried out by immersing the hydroxylated surface into a solution of an alkyl-silane (wet chemistry method) or by exposing the surface to a stream of alkyl-silane gas generated with pressure reduction and/or heat (vapour-phase method).…”
Section: Surface Chemical Modificationmentioning
confidence: 99%