2002
DOI: 10.21236/ada406016
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Self-Assembling Nanomembranes Through Electrostatic Melt Processing of Copolymer Films

Abstract: Polystyrene-polyisobutylene-polystyrene (SIBS) block copolymer films have been electrostatically melt processed in order to induce a preferential orientation in the material microstructure. The results show that electrostatic melt processing is inducing some change in the microstructure, but full reorientation is not being achieved. The low dielectric contrast of the SIBS blocks as well as the relatively short electrostatic processing times are the likely causes of incomplete alignment.

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“…A central goal of polymer chemistry is the design of materials with novel macroscopic properties by controlling the spontaneous generation of nanoscaled, phase separated networks [1,2]. A primary mechanism to generate such networks is through the "functionalization" of hydrophobic polymer chains by the addition of acid terminated side-chains, such as in the casting of perfluorosulfonic acid (PFSA) membranes, see Figure 1.…”
Section: Introductionmentioning
confidence: 99%
“…A central goal of polymer chemistry is the design of materials with novel macroscopic properties by controlling the spontaneous generation of nanoscaled, phase separated networks [1,2]. A primary mechanism to generate such networks is through the "functionalization" of hydrophobic polymer chains by the addition of acid terminated side-chains, such as in the casting of perfluorosulfonic acid (PFSA) membranes, see Figure 1.…”
Section: Introductionmentioning
confidence: 99%