Self‐Assembling of Block Copolymers with Alternative Solvents

Abstract

Block copolymer (BCP) lithography is one of the most technologically intriguing and scientifically interesting strategies for achieving nanometer‐sized features. This method usually exploits toluene as solvent for the deposition of BCPs in all the processing steps. However, this chemical has some technical disadvantages, such as high toxicity and hygroscopicity. The first aspect can limit its use on the industrial scale because of the protocols on the environmental and operator risks, while the second causes aging effects that can alter the results. In order to overcome these intrinsic limitations, a BCP self‐assembly (BCP‐SA) strategy is presented by using alternative deposition solvents in place of toluene. A preliminary study, based on the physical characteristics, such as volatility, polarity, and hygroscopicity, is carried out to explore two new alternative solvents, ethyl acetate and tetrahydrofuran. The effects on the BCP‐SA due to the new solvents are studied by SEM analysis supported by suitable software for the images elaboration. The results achieved show very promising outcomes for the polymer solutions obtained with ethyl acetate, in terms of uniformity of geometrical features, ordered areas extension, and homogeneity of the pattern obtained, making this chemical a good alternative to toluene.