Self-consistent simulation of the impedance matching network for single frequency capacitively coupled plasma

Gao, Jiamao; Yu, Shimin; Wu, Hao; Wang, Yu; Wang, Zhijiang; Pan, Yuan; Jiang, Wei; Zhang, Ya

doi:10.1088/1361-6463/ac49b6

Cited by 14 publications

(4 citation statements)

References 36 publications

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“…To simplify the model, the coupling with the secondary electron and external circuit model is not considered in this study. However, the matching network of RF driven CCP generally needs to be designed according to the power frequency [54,55]. The question of how to design the matching network of the CCP driven by an FM RF source remains an unsolved problem.…”

Section: Discussionmentioning

confidence: 99%

Numerical characterization of capacitively coupled plasma driven by tailored frequency modulated radio frequency source

Wang,

Zhou,

Chen

et al. 2024

Plasma Sources Sci. Technol.

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Capacitively coupled plasma (CCP) is widely used in plasma etching and deposition processes because of its low cost, simple structure, and easy generation of a uniform plasma in large areas. Conventional CCPs are operated under a fixed frequency power source; however, CCPs driven by a variable frequency power source are poorly understood. In this paper, numerical simulations of CCPs driven by frequency modulated (FM) radio frequency (RF) sources within the frequency range of 2 MHz to 18 MHz are carried out with a Particle-in-Cell/Monte Carlo collision model. Our research indicates that the CCP driven by an FM RF source can maintain a stable glow discharge and form a time-dependent plasma. Plasma density, electron and ion current, energy and heating rate, ion flux, and energy on the electrodes fluctuate consistently with the FM period. The electron and ion energy distribution function can also be modulated by the frequency variation of the FM source. A multi-peak structure that varies and shifts with frequency variation is observed in the ion energy distribution function. In addition, by fixing the chirp period while varying the start or end frequency of the chirp signal (start frequency from 0.4 to 6 MHz, or end frequency from 18 to 48 MHz), effective modulations can be produced on the electron density, electron energy, and the shape of the EEPF and IEDF.

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Section: Discussionmentioning

confidence: 99%

Numerical characterization of capacitively coupled plasma driven by tailored frequency modulated radio frequency source

Wang,

Zhou,

Chen

et al. 2024

Plasma Sources Sci. Technol.

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“…As a result, the RF generator risks being damaged while inefficient power is transferred to the plasma. To prevent this situation, a matching network is designed to adjust the impedance (seen by the RF generator) to the plasma impedance [73] . This device is typically composed of inductors utilized to build up and store energy, as well as variable capacitors to tune the impedance and create a match between the source and the load.…”

Section: Radio Frequency (Rf) Plasma Devicesmentioning

confidence: 99%

From Basics to Frontiers: A Comprehensive Review of Plasma-Modified and Plasma-Synthesized Polymer Films

Dufour

2023

Polymers

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This comprehensive review begins by tracing the historical development and progress of cold plasma technology as an innovative approach to polymer engineering. The study emphasizes the versatility of cold plasma derived from a variety of sources including low-pressure glow discharges (e.g., radiofrequency capacitively coupled plasmas) and atmospheric pressure plasmas (e.g., dielectric barrier devices, piezoelectric plasmas). It critically examines key operational parameters such as reduced electric field, pressure, discharge type, gas type and flow rate, substrate temperature, gap, and how these variables affect the properties of the synthesized or modified polymers. This review also discusses the application of cold plasma in polymer surface modification, underscoring how changes in surface properties (e.g., wettability, adhesion, biocompatibility) can be achieved by controlling various surface processes (etching, roughening, crosslinking, functionalization, crystallinity). A detailed examination of Plasma-Enhanced Chemical Vapor Deposition (PECVD) reveals its efficacy in producing thin polymeric films from an array of precursors. Yasuda’s models, Rapid Step-Growth Polymerization (RSGP) and Competitive Ablation Polymerization (CAP), are explained as fundamental mechanisms underpinning plasma-assisted deposition and polymerization processes. Then, the wide array of applications of cold plasma technology is explored, from the biomedical field, where it is used in creating smart drug delivery systems and biodegradable polymer implants, to its role in enhancing the performance of membrane-based filtration systems crucial for water purification, gas separation, and energy production. It investigates the potential for improving the properties of bioplastics and the exciting prospects for developing self-healing materials using this technology.

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“…The external circuit has a significant impact on the breakdown process [29] and steady-state results [30] of CCP discharges, and is considered to be the main cause of voltage harmonics between the electrodes [31]. Impedance matching can optimize the transfer of power supplied by the generator to the plasma load and reduce the reflection of power.…”

Section: Introductionmentioning

confidence: 99%

Kinetic simulations of capacitively coupled plasmas driven by tailored voltage waveforms with multi-frequency matching

Yu,

Wu,

Yang

et al. 2024

Plasma Sources Sci. Technol.

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Impedance matching is crucial for optimizing plasma generation and reducing power reflection in capacitively coupled plasmas (CCP). Designing these matchings is challenging due to the varying and typically unknown impedance of the plasma, especially in the presence of multiple driving frequencies. Here, a computational design method for impedance matching networks (IMNs) for CCPs is proposed and applied to discharges driven by tailored voltage waveforms (TVW). This method is based on a self-consistent combination of particle in cell/Monte Carlo collision simulations of the plasma with Kirchhoff’s equations to describe the external electrical circuit. Two Foster second-form networks with the same structure are used to constitute an L-type matching network, and the matching capability is optimized by iteratively updating the values of variable capacitors inside the IMN. The results show that the plasma density and the power absorbed by the plasma continuously increase in the frame of this iterative process of adjusting the matching parameters until an excellent impedance matching capability is finally achieved. Impedance matching is found to affect the DC self-bias voltage, whose absolute value is maximized when the best matching is achieved. Additionally, a change in the quality of the impedance matching is found to cause an electron heating mode transition. Poor impedance matching results in a heating mode where electron power absorption in the plasma bulk by drift electric fields plays an important role, while good matching results in the classical α-mode operation, where electron power absorption by ambipolar electric fields at the sheath edges dominates. The method proposed in this work is expected to be of great significance in promoting TVW plasma sources from theory to industrial application, since it allows designing the required complex multi-frequency IMNs.

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Self-consistent simulation of the impedance matching network for single frequency capacitively coupled plasma

Cited by 14 publications

References 36 publications

Numerical characterization of capacitively coupled plasma driven by tailored frequency modulated radio frequency source

Numerical characterization of capacitively coupled plasma driven by tailored frequency modulated radio frequency source

From Basics to Frontiers: A Comprehensive Review of Plasma-Modified and Plasma-Synthesized Polymer Films

Kinetic simulations of capacitively coupled plasmas driven by tailored voltage waveforms with multi-frequency matching

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